Homo-epitaxial growth on misoriented GaN substrates by MOCVD

Springer Science and Business Media LLC - Tập 5 - Trang 425-431 - 2020
A. R. A. Zauner1, J. J. Schermer1, W. J. P. van Enckevort1, V. Kirilyuk1, J. L. Weyher1,2, I. Grzegory2, P. R. Hageman1, P. K. Larsen1
1Research Institute for Materials, University of Nijmegen, Nijmegen, The Netherlands
2High Pressure Research Center, Polish Academy of Sciences, Warsaw, Poland

Tóm tắt

The N-side of GaN single crystals with off-angle orientations of 0°, 2°, and 4° towards the $$\left[ {10\bar 10} \right]$$ direction was used as a substrate for homo-epitaxial MOCVD growth. The highest misorientation resulted in a reduction of the density of grown hillocks by almost two orders of magnitude as compared with homo-epitaxial films grown on the exact $$\left( {000\bar 1} \right)$$ surface. The features still found on the 4° misoriented sample after growth can be explained by a model involving the interaction of steps, introduced by the misorientation and the hexagonal hillocks during the growth process.

Tài liệu tham khảo

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