Use of finite gate widths in multipoint correlation methods for DLTS characterization of semiconductors

Solid-State Electronics - Tập 36 - Trang 119-124 - 1993
A.Avila G.1
1Dep. Ing. Eléctrica, CINVESTAV del I.P.N., Apartado postal 14740, México 14, D. F.

Tài liệu tham khảo

Lang, 1974, J. Appl. Phys., 45, 3023, 10.1063/1.1663719 Miller, 1977, Ann. Rev. of Mater. Sci., 377, 10.1146/annurev.ms.07.080177.002113 Miller, 1975, J. Appl. Phys., 46, 2638, 10.1063/1.321896 Crowell, 1980, Solid-St. Electron., 24, 25, 10.1016/0038-1101(81)90209-4 Okushi, 1980, Jap. J. Appl. Phys., 19, L335, 10.1143/JJAP.19.L335 Kirchner, 1981, J. Appl. Phys., 52, 6462, 10.1063/1.328595 Farmer, 1982, Appl. Phys. Lett., 41, 1063, 10.1063/1.93401 Ikeda, 1982, Jap. J. Appl. Phys., 21, 462, 10.1143/JJAP.21.462 Chang, 1984, IEEE Trans. Instr. Meas., IM-33, 259, 10.1109/TIM.1984.4315221 Hasegawa, 1985, Jap. J. Appl. Phys., 24, 1356, 10.1143/JJAP.24.1356 Langfeld, 1987, Appl. Phys. A, 44, 107, 10.1007/BF00626409 Ball, 1991, Rev. Sci. Instrum., 62, 2831, 10.1063/1.1142169 Dmowski, 1990, Rev. Sci. Instrum., 61, 1319, 10.1063/1.1141180 Dmowski, 1987, Rev. Instrum., 58, 75, 10.1063/1.1139517 Maguire, 1986, IEEE Trans. Instr. Meas., IM-35, 313, 10.1109/TIM.1986.6499216