Formation and photodetachment of cold metal cluster negative ions

Journal of Chemical Physics - Tập 83 Số 8 - Trang 4273-4274 - 1985
Lan Zheng1, P.J. Brucat1, C. L. Pettiette1, Shihe Yang1, R. E. Smalley1
1Rice Quantum Institute and Department of Chemistry, Rice University Houston, Texax 77251

Tóm tắt

A general method is described for the formation of cold metal cluser negative ion beams which serve as excellent sources for photodetachment experiments. The method involves the pulsed laser vaporization of a metal target at the throat of a pulsed supersonic helium expansion. By the optimization of source conditions, intense beams (greater than 105 ions/pulse) of both positive and negative ions are produced routinely. Ionization of the metal cluster molecules, either during vaporization or by irradiation with 193 nm light, occurs prior to supersonic expansion and produces a cold plasma entrained in the neural flow that is renitent to stray electric and magnetic fields, unlike photoions produced in the collisionless downstream molecular beam. The enhancement of the negative ion flux by 193 nm irradiation is believed to be evidence for efficient electron attachment of low energy photoelectrons generated in the nozzle region. This attachment process, however, is apparently not effective for molecules containing less than ∼4 metal atoms. Laser irradition of mass-selected cluster anions extracted from these cold ion beams reveal that photodetachment of the metal cluster negative ion is always the preferred pathway, even when fragmentation of the ion is possible. This new negative ion production technique should therefore permit measurement of both electron affinities and photoelectron spectra as a function of cluster size and composition.

Từ khóa


Tài liệu tham khảo

1981, Phys. Rev. A, 23, 1673, 10.1103/PhysRevA.23.1673

1980, J. Chem. Phys., 72, 694, 10.1063/1.438904

1979, J. Chem. Phys., 71, 2057, 10.1063/1.438597

1982, J. Chem. Phys., 77, 1153, 10.1063/1.443980

1980, J. Chem. Phys., 73, 4419, 10.1063/1.440678

1978, J. Chem. Phys., 70, 2652

1983, J. Chem. Phys., 78, 2866, 10.1063/1.445273

1984, J. Chem. Phys., 81, 3846, 10.1063/1.448168

1983, Chem. Phys. Lett., 99, 161, 10.1016/0009-2614(83)80551-X

1984, J. Phys. Chem., 88, 4497, 10.1021/j150664a011

1984, J. Chem. Phys., 81, 4883, 10.1063/1.447515

1984, J. Chem. Phys., 81, 1048, 10.1063/1.447741

1983, Phys. Rev. A, 28, 1531, 10.1103/PhysRevA.28.1531

1981, J. Chem. Phys., 74, 1580, 10.1063/1.441289

1984, Chem. Phys. Lett., 112, 285, 10.1016/0009-2614(84)85742-5

1985, J. Chem. Phys., 82, 5288, 10.1063/1.448605

1983, J. Phys. Chem., 87, 5228, 10.1021/j150643a033

1984, Chem. Phys. Lett., 104, 526, 10.1016/0009-2614(84)80022-6

1984, Ber. Bunsenges. Phys. Chem., 88, 270, 10.1002/bbpc.19840880322

1981, J. Chem. Phys., 74, 6511, 10.1063/1.440991

1982, J. Phys. Chem., 86, 2556, 10.1021/j100211a002

1983, J. Chem. Phys., 78, 1627, 10.1063/1.444961

Thông tin
Thông tin xuất bản

Journal of Chemical Physics

Tập 83 Số 8

4273-4274

Thông tin tác giả