Application of Dielectric Barrier Discharge Reactor Immersed in Wastewater to the Oxidative Degradation of Organic Contaminant

Plasma Chemistry and Plasma Processing - Tập 27 - Trang 51-64 - 2007
Young Sun Mok1, Jin-Oh Jo1, Heon-Ju Lee2, Hyun Tae Ahn3, Jeong Tai Kim3
1Department of Chemical Engineering, Cheju National University, Jeju, South Korea
2Department of Energy Engineering, Cheju National University, Jeju, South Korea
3Department of Architectural Engineering, Kyung Hee University, Yongin-si, Korea

Tóm tắt

Dielectric barrier discharge (DBD) is an effective method available for the production of ozone and ultraviolet light. The wastewater treatment system of this study was designed to utilize both ozone and ultraviolet light produced in the DBD reactor for the degradation of organic contaminant. The DBD reactor consisted of a quartz cylinder and a coaxial ceramic tube inside of which a steel rod was placed. The DBD reactor was immersed in the wastewater that was grounded. In this case, the wastewater acted not only as an electrode but also as the cooling medium for the DBD reactor. An azo dye, Acid Red 27, was used as the organic contaminant. In this system, the organic contaminant was degraded by two oxidation pathways induced by ozone and ultraviolet light. The concentration of ozone, the ultraviolet radiation intensity and the degradation efficiency of the organic contaminant were measured by varying the discharge. The results showed that the present system was very effective for the degradation of the organic contaminant. The energy requirement for the degradation was found to be 0.654 kJ/mg, which is much smaller value than those obtained with an ultraviolet/photocatalytic process.

Tài liệu tham khảo

Henrikson JT, Savage PE (2004) American Inst Chem Eng J 49(3):718 Jia J, Yang J, Liao J, Wang W, Wang Z (1999) Water Res 33(3):881 Konsowa AH (2003) Desalination 158:233 Nickelsen MG, Cooper WJ, Kurucz CN, Waite TD (1992) Environ Sci Technol 26:144 Petrier C, Lamy M, Francony A, Benahcene A, David B, Renaudin V, Gondrexon N (1994) J Phys Chem 98:10514 Daneshvar N, Rabbani M, Modirshahla N, Behnajady MA (2004) J Photochem Photobiol A: Chem 168:39 Wen Y, Jiang X, Liu W (2002) Plasma Chem Plasma Proc 22(1):175 Lukes P, Appleton T, Locke BR (2004) IEEE Trans Ind Appl 40(1):60 Rodríguez JB, Mutis A, Yeber MC, Freer J, Baeza J, Mansilla HD (1999) Water Sci Technol 40:267 Getoff N (2001) Res Chem Intermed 27:343 Lee H-J, Kang D-W, Chi J, Lee DH (2003) Korean J Chem Eng 20(3):503 Faraggi M, Carmichael A, Riez P (1984) Int J Radiat Biol 46:703 Pekakis PA, Xekoukoulotakis NP, Mantzavinos D (2006) Water Res 40:1276 Tratnyek PG, Elovitz MS, Colverson P (1994) Environ Toxicol Chem 13:27 Han D, Yang H, Kwon KJ (1994) J Korean Soc Environ Eng 16(7):885 Pashaie B, Dhali SK, Honea FI (1994) J Phys D: Appl Phys 27:2107 Zhang R, Wang L, Zhang C, Nie Y, Wu Y, Guan Z (2006) IEEE Trans Plasma Sci 34(3):1033 Kim Y, Hong SH, Cha MS, Song YH, Kim SJ (2003) J Adv Oxid Technol 6(1):17 Kogelschatz U (2003) Plasma Chem Plasma Proc 23(1):1 Mok YS, Jo J-O (2006) IEEE Trans Plasma Sci 34(6):2624 Rosocha LA (2005) IEEE Trans Plasma Sci 33(1):129 Shin DN, Park CW, Hahn JW (2000) Bull Korean Chem Soc 21(2):228 Nicole I, de Laat J, Dore M, Duget JP, Bonnel C (1990) Water Res 24:157 Zhang J, Xu H, Chen H, Anpo M (2003) Res Chem Intermed 29:839 Padmaja S, Madison SA (1999) J Phys Org Chem 12:221 Lopez A, Benbelkacem H, Pic J-S, Debellefontaine H (2004) Environ Technol 25:311 Wen Y, Jiang X (2001) Plasma Chem Plasma Proc 21(3):345 Staehelin J, Buhler RE, Hoigne J (1984) J Phys Chem 88:5999 Khraisheh MAM (2003) Coloration Technol 119:24