IEEE Conference Record - Abstracts. 2002 IEEE International Conference on Plasma Science (Cat. No.02CH37340)
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Enhanced Raman scattering of a rippled laser beam in laser-plasma interaction
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Summary form only given, as follows. In the laser-plasma interaction experiments, self-focusing and filamentation affect quite a large number of other parametric processes including stimulated scattering processes. It has also been experimentally observed that SRS is more prone to the nonlinearly refraction-induced enhancement in the intensity of the filaments. This situation is qualitatively well......
#Raman scattering #Laser beams #Laser excitation #Laser modes #Particle beams #Electron beams #Plasma waves #Magnetic fields #Optical coupling #Optical refraction
Sheet shaped plasma production using microwave-plasma interaction with ECR region
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Summary form only given. To control the shape of high density plasma has been one of the issues for the application of plasma to industrial usages. Therefore, ECR plasma is a good candidate of a high density plasma. A sheet shaped high density plasma could be used to modify the surface of materials uniformly and as the basis for electron accelerators. The discharge parameters, such as ECR conditio......
#Production #Plasma density #Plasma accelerators #Plasma applications #Plasma materials processing #Plasma waves #Plasma measurements #Shape control #Magnetic field measurement #Industrial control
Quantum extension of Child-Langmuir law
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Summary form only given, as follows. In the advent fields of nano-technology, electrode gaps with scales down to nanometer regime can be fabricated. On such a nano scale, quantum effects such as electron tunneling and the electron exclusion principle become important in the study of beam-gap interaction. We extend the classical Child-Langmuir law into the quantum regime including the effects of el......
#Electrodes #Electron beams #Tunneling #Voltage #Plasmas #Equations #Current density #Matter waves #Solid modeling #Geometry
Selective neuron growth on ion implanted and plasma deposited surfaces
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Summary form only given. To learn about how large systems of neurons communicate, we need to develop, among other things, methods for growing patterned networks of large numbers of neurons. Success with this challenge will be important to our understanding of how the brain works as well as to novel kinds of computer architecture. Large in vitro networks could show, for example, the emergence of st......
#Neurons #Plasma immersion ion implantation #Ion implantation #Substrates #Plasma sources #Optical films #Optical filters #Vacuum arcs #Elementary particle vacuum #Vacuum systems
Low pressure arcing on graphite: evidence of a columnar growth within the cathode spot
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Summary form only given, as follows. Graphite cathode sources are used in arc ion plating devices for diamond-like film synthesis. A series of experimental studies and recent modeling results have been published on the problem of the detrimental co-emission of macro-particles from these sources. These suggested the emitted spherical carbon particles were a result of the local plasma conditions abo......
#Cathodes #Carbon dioxide #Surface morphology #Plasma temperature #Plasma properties #Plasma devices #Plasma sources #Electrodes #Raman scattering #Spectroscopy
Angle-resolved ion charge state distribution measurements in a vacuum arc plasma using time-of-flight mass spectroscopy
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Summary form only given. In vacuum arc discharges the current is conducted through vapor evaporated from the cathode surface, creating very dense, highly ionized plasmas from any metallic or conducting solid. Vacuum arc sources are currently used for ground-based material deposition systems and to form very high energy, heavy ion beams for fusion applications. Space propulsion engines using vacuum......
#Plasma measurements #Current measurement #Charge measurement #Vacuum arcs #Mass spectroscopy #Plasma materials processing #Plasma sources #Arc discharges #Plasma devices #Plasma accelerators
Axial modes of the gyrotron backward-wave oscillator
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Summary form only given, as follows. The gyrotron backward-wave oscillator (gyro-BWO) employs a waveguide structure in which no cold resonant modes exist. In addition, the feedback loop comprises the forward moving beam and the backward propagating wave. End reflections in principle play no role in forming the gyro-BWO field. The field pattern of the oscillating mode must then depend entirely on t......
#Gyrotrons #Oscillators #Microwave technology #Frequency #Microwave amplifiers #Magnetic fields #Electrons #Power amplifiers #Resonance #Feedback loop
High-power helium inductively coupled plasma source for elemental analysis
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Summary form only given. The argon inductively coupled plasma (ICP) has been successfully used as an ion source for mass spectrometry (ICPMS) and an excitation source for atomic emission spectrometry (ICP-AES). However, the use of argon as a plasma gas has some limitations. Especially, the argon ICP does not exhibit efficient performance for higher ionization energy elements such as nonmetals, rar......
#Helium #Plasma sources #Argon #Ionization #Plasma density #Plasma measurements #Electrons #Plasma materials processing #Coolants #Plasma stability
Using radio-frequency electrical measurements as a plasma diagnostic
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Summary form only given. Radio frequency (RF) current and voltage measurements are an important and convenient tool for monitoring RF discharges. These measurements are compatible with commercial reactors and with the manufacturing environment. Recently, methods have been proposed for using RF electrical measurements to monitor process-relevant plasma properties. These methods rely on models that ......
#Radio frequency #Electric variables measurement #Plasma measurements #Plasma diagnostics #Energy measurement #Testing #Current measurement #Monitoring #Plasma properties #Plasma sheaths
Electrodeless microwave plasma torch at atmospheric pressure
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Summary form only given, as follows. Environmental clean-up and energy efficiency enhancement utilize plasma generated from air at the atmospheric pressure. Perfluorocompounds (PFC's), which have long lifetimes and large global warming potentials, are widely used during plasma etching and plasma-assisted chamber cleaning processes in metal and dielectric film chemical vapor deposition (CVD) system......
#Atmospheric-pressure plasmas #Plasma applications #Plasma chemistry #Plasma sources #Plasma waves #Magnetrons #Electromagnetic waveguides #Plasma devices #Electromagnetic heating #Microwave ovens