Using in-line equipment condition and yield information for maintenance scheduling and dispatching in semiconductor wafer fabs
Tóm tắt
Yield is one of the most important measures of manufacturing performance in the semiconductor industry, and equipment condition plays a critical role in determining yield. Researchers and practitioners alike have traditionally treated the problems of equipment maintenance scheduling and production dispatching independently, ignoring how equipment condition may affect different product types or families in different ways. This paper addresses the problem of how to schedule maintenance and production for a multiple-product, multiple-stage production system. The problem is based on the situation found in semiconductor wafer fabrication where the equipment condition deteriorates over time, and this condition affects the yield of the production process. We extend a recently developed Markov decision process model of a single-stage system to account for the fact that semiconductor wafers have multiple layers and thus make repeated visits to each workstation. We then propose a methodology by which the single-stage results can be applied in a multi-stage system. Using a simulation model of a four-station wafer fab, we test the policies generated by the model against a variety of other maintenance and dispatching policy combinations. The results indicate that our method provides substantial improvements over traditional methods and performs better as the diversity of the product set increases. In the scenarios examined, the reward earned using the policies from the combined production and maintenance scheduling method was an average of more than 70% higher than the reward earned using other policy combinations such as a fixed-state maintenance policy and a first-come, first-serve dispatching policy.
Tài liệu tham khảo
citation_journal_title=Operations Research; citation_title=Part dispatch in random yield multistage flexible test systems for printed circuit boards; citation_author=R. Akella, S. Rajagopalan, M.R. Singh; citation_volume=40; citation_publication_date=1992; citation_pages=776-789; citation_id=CR1
citation_journal_title=IEEE Transactions on Semiconductor Manufacturing; citation_title=Benefits of real-time, in situ particle monitoring in production medium current implantation; citation_author=P.G. Borden, L.A. Larson; citation_volume=2; citation_publication_date=1989; citation_pages=141-145; citation_id=CR2
citation_title=A Guide to Simulation; citation_publication_date=1987; citation_id=CR3; citation_author=P. Bratley; citation_author=B. Fox; citation_author=L. Schrage; citation_publisher=Springer-Verlag
citation_title=Real-time process monitoring; citation_inbook_title=Proceedings of the 1996 7th Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference; citation_publication_date=1996; citation_pages=382-390; citation_id=CR4; citation_author=R.J. Bunkofske; citation_author=N.T. Pascoe; citation_author=J.Z. Colt; citation_author=M.W. Smit; citation_publisher=IEEE Press
citation_title=Optimizing semiconductor fabrication scheduling in the face of uncertainty; citation_publication_date=1998; citation_id=CR5; citation_author=T. Chitchachornvanich; citation_publisher=Department of Industrial Engineering and Operations Research, University of California
citation_title=Applications of spatial statistics to semiconductor wafer defects; citation_publication_date=1995; citation_id=CR6; citation_author=S.P. Cunningham; citation_publisher=Department of Industrial Engineering and Operations Research, University of California
citation_journal_title=IEEE Transactions on Semiconductor Manufacturing; citation_title=Statistical methods for visual defect metrology; citation_author=S.P. Cunningham, S. MacKinnon; citation_volume=11; citation_publication_date=1998; citation_pages=48-53; citation_id=CR7
citation_title=Model-based control in microelectronics manufacturing; citation_inbook_title=Proceedings of the IEEE Conference on Decision and Control; citation_publication_date=1999; citation_pages=4185-4191; citation_id=CR8; citation_author=T.F. Edgar; citation_author=W.J. Cambell; citation_author=C. Bode; citation_publisher=IEEE Press
citation_journal_title=IEEE Transactions on Semiconductor Manufacturing; citation_title=Closed-loop job release control for VLSI circuit manufacturing; citation_author=C.R. Glassey, M.G.C. Resende; citation_volume=1; citation_publication_date=1988; citation_pages=36-46; citation_id=CR9
citation_journal_title=IEEE Transactions on Semiconductor Manufacturing; citation_title=Linear control rules for production control of semiconductor fabs; citation_author=C.R. Glassey, J.G. Shanthikumar, S. Seshadri; citation_volume=9; citation_publication_date=1996; citation_pages=536-549; citation_id=CR10
citation_title=Stabilizing work-in-process and smoothing production in a production system with random yield; citation_publication_date=1990; citation_id=CR11; citation_author=L. Gong; citation_author=H. Matsuo; citation_publisher=Graduate School of Business, University of Texas
citation_journal_title=Journal of Optimization Theory and Applications; citation_title=Control policy for a manufacturing system with random yield and rework; citation_author=L. Gong, H. Matsuo; citation_volume=95; citation_publication_date=1997; citation_pages=149-175; citation_id=CR12
citation_journal_title=Semiconductor International; citation_title=
In-situ particle monitoring reduces wafer defects; citation_author=J. Hunter, H.K. Nguyen; citation_volume=16; citation_publication_date=1993; citation_pages=80-84; citation_id=CR13
citation_title=Simulation Modeling and Analysis; citation_publication_date=1991; citation_id=CR14; citation_author=A.M. Law; citation_author=W.D. Kelton; citation_publisher=McGraw-Hill
citation_title=Advanced yield enhancement: integrated yield analysis; citation_inbook_title=Proceedings of the 1997 IEEE/SEMI Advanced Semiconductor Manufacturing Conference; citation_publication_date=1997; citation_pages=67-75; citation_id=CR15; citation_author=F. Lee; citation_publisher=IEEE Press
citation_journal_title=Management Science; citation_title=Simultaneous determination of production cycle and inspection schedules in a production system; citation_author=H.L. Lee, M.J. Rosenblatt; citation_volume=33; citation_publication_date=1987; citation_pages=1125-1136; citation_id=CR16
citation_journal_title=IIE Transactions; citation_title=A production and maintenance planning model with restoration cost dependent on detection delay; citation_author=H.L. Lee, M.J. Rosenblatt; citation_volume=21; citation_publication_date=1989; citation_pages=368-375; citation_id=CR17
citation_journal_title=Operations Research; citation_title=Production control in multistage systems with variable yield losses; citation_author=H.L. Lee, C.A. Yano; citation_volume=36; citation_publication_date=1988; citation_pages=269-278; citation_id=CR18
citation_journal_title=Journal of the Operational Research Society; citation_title=Joint determination of production cycle and inspection intervals in a deteriorating production system; citation_author=J.S. Lee, K.S. Park; citation_volume=42; citation_publication_date=1991; citation_pages=775-783; citation_id=CR19
citation_journal_title=Journal of the Operational Research Society; citation_title=An EMQ model with inspections and random machine failures; citation_author=V. Makis, J. Fung; citation_volume=49; citation_publication_date=1998; citation_pages=66-76; citation_id=CR20
citation_journal_title=Management Science; citation_title=Linear programming and sequential decisions; citation_author=A. Manne; citation_volume=6; citation_publication_date=1960; citation_pages=259-267; citation_id=CR21
citation_journal_title=IEEE Transactions on Semiconductor Manufacturing; citation_title=Automated malfunction diagnosis of semiconductor fabrication equipment: a plasma etch application; citation_author=G.S. May, C.J. Spanos; citation_volume=6; citation_publication_date=1993; citation_pages=28-40; citation_id=CR22
citation_journal_title=IEEE Transactions on Semiconductor Manufacturing; citation_title=In-line defect sampling methodology in yield management: an integrated framework; citation_author=R.K. Nurani, R. Akella, A.J. Strojwas; citation_volume=9; citation_publication_date=1996; citation_pages=506-517; citation_id=CR23
citation_journal_title=IEEE Transactions on Semiconductor Manufacturing; citation_title=In-line yield prediction methodologies using patterned wafer inspection information; citation_author=R.K. Nurani, A.J. Strojwas, W.P. Maly, C. Ouyang, W. Shindo, R. Akella, M.G. McIntyre, J. Derrett; citation_volume=11; citation_publication_date=1998; citation_pages=40-47; citation_id=CR24
citation_journal_title=Semiconductor International; citation_title=Twenty good reasons to use in situ particle monitors; citation_author=L. Peters; citation_volume=15; citation_publication_date=1992; citation_pages=52-57; citation_id=CR25
citation_journal_title=Operations Research; citation_title=Optimal lot sizing, process quality improvement and setup cost reduction; citation_author=E.L. Porteus; citation_volume=34; citation_publication_date=1986; citation_pages=137-144; citation_id=CR26
citation_journal_title=Management Science; citation_title=The impact of inspection delay on process and inspection lot sizing; citation_author=E.L. Porteus; citation_volume=36; citation_publication_date=1990; citation_pages=999-1007; citation_id=CR27
citation_journal_title=IIE Transactions; citation_title=Economic production cycles with imperfect production processes; citation_author=M.J. Rosenblatt, H.L. Lee; citation_volume=18; citation_publication_date=1986; citation_pages=48-54; citation_id=CR28
citation_title=Framework for extracting defect density information for yield modeling from in-line defect inspection for real-time prediction of random defect limited yields; citation_inbook_title=Proceedings of the IEEE International Symposium on Semiconductor Manufacturing Conference; citation_publication_date=1999; citation_pages=403-406; citation_id=CR29; citation_author=J. Segal; citation_author=A. Gordon; citation_author=D. Sajoto; citation_author=B. Duffy; citation_author=M. Kumar; citation_publisher=IEEE Press
citation_title=Stochastic wafer fabrication scheduling; citation_publication_date=1997; citation_id=CR30; citation_author=Y. Shen; citation_publisher=Department of Industrial Engineering and Operations Research, University of California
citation_journal_title=Production and Operations Management; citation_title=Combined production and maintenance scheduling for a multiple-product, single-machine production system; citation_author=T. Sloan, J.G. Shanthikumar; citation_volume=9; citation_publication_date=2000; citation_pages=379-399; citation_id=CR31
citation_journal_title=Journal of Vacuum Science and Technology, A: Vacuum, Surfaces, and Films; citation_title=Current capabilities and limitations of in situ particle monitors in silicon processing equipment; citation_author=K.M. Takahashi, J.E. Daugherty; citation_volume=14; citation_publication_date=1996; citation_pages=2983-2993; citation_id=CR32
citation_journal_title=Management Science; citation_title=Controlling inventories in an acyclic assembly system; citation_author=C.S. Tang; citation_volume=38; citation_publication_date=1992; citation_pages=743-750; citation_id=CR33
citation_journal_title=IIE Transactions; citation_title=A review of production planning and scheduling models in the semiconductor industry part I: system characteristics, performance evaluation and production planning; citation_author=R. Uzsoy, C.-Y. Lee, L.A. Martin-Vega; citation_volume=24; citation_publication_date=1992; citation_pages=47-60; citation_id=CR34
citation_journal_title=IEEE Transactions on Semiconductor Manufacturing; citation_title=Scheduling semiconductor wafer fabrication; citation_author=L.M. Wein; citation_volume=1; citation_publication_date=1988; citation_pages=115-130; citation_id=CR35
citation_journal_title=Operations Research; citation_title=Random yield, rework and scrap in a multistage batch manufacturing environment; citation_author=A.S. Wein; citation_volume=40; citation_publication_date=1992; citation_pages=551-563; citation_id=CR36
citation_title=Stochastic Modeling and the Theory of Queues; citation_publication_date=1989; citation_id=CR37; citation_author=R.W. Wolff; citation_publisher=Prentice Hall
citation_journal_title=Operations Research; citation_title=Lot sizing with random yields: a review; citation_author=C.A. Yano, H.L. Lee; citation_volume=43; citation_publication_date=1995; citation_pages=311-334; citation_id=CR38