Ultra-smooth metal surfaces generated by pressure-induced surface deformation of thin metal films

Applied Physics A Solids and Surfaces - Tập 87 - Trang 187-192 - 2007
V.J. Logeeswaran1, M.-L. Chan2, Y. Bayam1, M. Saif Islam1, D.A. Horsley2, X. Li3, W. Wu3, S.Y. Wang3, R.S. Williams3
1Integrated Nanodevices and System Research, Department of Electrical and Computer Engineering, University of California, Davis, USA
2Mechanical and Aeronautical Engineering Department, University of California, Davis, USA
3Quantum Science Research, Hewlett-Packard Laboratories, Palo Alto, USA

Tóm tắt

We present a mechanical pressing technique for generating ultra-smooth surfaces on thin metal films by flattening the bumps, asperities, rough grains and spikes of a freshly vacuum deposited metal film. The method was implemented by varying the applied pressure from 100 MPa to 600 MPa on an e-beam evaporated silver film of thickness 1000 Å deposited on double-polished (100)-oriented silicon surfaces, resulting in a varying degree of film smoothness. The surface morphology of the thin film was studied using atomic force microscopy. Notably, at a pressure of ∼600 MPa an initial silver surface with 13-nm RMS roughness was plastically deformed and transformed to an ultra-flat plane with better than 0.1 nm RMS. Our demonstration with the e-beam evaporated silver thin film exhibits the potential for applications in decreasing the scattering-induced losses in optical metamaterials, plasmonic nanodevices and electrical shorts in molecular-scale electronic devices.

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