Thay Đổi Do Chiếu Xạ UV Trong Đặc Trưng Cấu Trúc và Quang Học Của Màng Mỏng Silicon Phthalocyanine Dichloride (SiPcCl2)

Silicon - Tập 13 - Trang 4601-4609 - 2020
D. G. El-Damhogi1, H. M. El-Mallah1, Mohamed Abd el-Salam2, E. Elesh3
1Department of Physics and Mathematical Engineering, Faculty of Engineering, University of Port Said, Port Said, Egypt
2Department of Physics, Faculty of Science, University of Suez Canal, Ismailia, Egypt
3Department of Physics, Faculty of science, University of Port Said, Port Said, Egypt

Tóm tắt

Trong nghiên cứu hiện tại, các màng mỏng SiPcCl2 được chế tạo mới như một chất bán dẫn hữu cơ đã được nghiên cứu thực nghiệm. Các màng được chuẩn bị bằng kỹ thuật bốc hơi nhiệt trên các nền vật liệu thủy tinh và thạch anh, sau đó được chiếu xạ UV từ 60 phút đến 350 phút. Thành phần hóa học phân tử của SiPcCl2 ở dạng bột, các màng được chế tạo và được chiếu xạ tia cực tím đã được phân tích bằng kỹ thuật hồng ngoại biến đổi Fourier (FT-IR). Hình ảnh chụp hiển vi điện tử quét (SEM) và cấu trúc tán xạ tia X (XRD) đã xác nhận cấu trúc vô định hình cho các màng được chế tạo và chiếu xạ UV. Hơn nữa, quá trình chuyển tiếp cho phép gián tiếp với khoảng cách quang học, Eopt. là 1.77 eV đã giảm xuống còn 1.65 eV khi được chiếu xạ tia cực tím trong 350 phút. Một số thông số quang học quan trọng cho màng được chế tạo như: hệ số hấp thụ mol (ξmolar = 7430 mol/cm), cường độ lưỡng cực điện tử (q2 = 0.35Å2) và cường độ dao động (f = 0.20) của các quá trình chuyển tiếp quang đã được ước lượng và cũng cho các màng đã được chiếu xạ.

Từ khóa

#SiPcCl2 #màng mỏng #bán dẫn hữu cơ #chiếu xạ UV #cấu trúc vô định hình #khoảng cách quang học #hồng ngoại biến đổi Fourier #hiển vi điện tử quét #tán xạ tia X.

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