Transition metals in silicon
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K.V. Ravi:Imperfections and Impurities in Semiconductor Silicon (Wiley, New York 1981)
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E.R. Weber, N. Wiehl: To be published
B.I. Boltaks:Diffusion in Semiconductors (Infosearch, London 1963)
B.L. Sharma:Diffusion in Semiconductors (Trans. Tech. Publications, Clausthal-Zellerfeld 1970)
T. Chang, A.H. Kahn: NBS Special Publication260-259 (1978)
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Quenching experiments from 1250 °C using phosphorus doped silicon failed to detect by EPR Si-E centers (Ps+V), the dominant defect in irradiatedn-Si. The detection limit was lower than 1011cm?3 [79]
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For Si: Cu the validity of this assumption (i.e.?1/2=1) has been proved [99], resulting only in a minor correction of ***a due to the introduction of?1/2?1
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A.G. Milnes:Deep Impurities in Semiconductors (Wiley, New York 1973)
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Graff et al. [6] ascribe the Ev+0.21eV level to an (FeAl) acceptor and Ev+0.13 eV to the (FeAl) donor; however, as pointed out by Wünstel and Wagner [85] the lower level has to be due to some other complex and, in accordance with Feichtinger [131] the upper level corresponds to the (FeAl)0/+ donor, [97]
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