Thermal effects on the growth by metal organic chemical vapour deposition of TiO2 thin films on (100) GaAs substrates

Surface and Coatings Technology - Tập 151 - Trang 36-41 - 2002
A. Brevet1, F. Fabreguette2, L. Imhoff1, M.C. Marco de Lucas1, O. Heintz1, L. Saviot3, M. Sacilotti2, S. Bourgeois1
1Laboratoire de Recherches sur la Réactivité des Solides, UMR 5613, CNRS-Université de Bourgogne, 9 avenue A. Savary, BP 47870, 21078 Dijon, Cedex, France
2Laboratoire de Physique de l'Université de Bourgogne, CNRS-Université de Bourgogne, 9 avenue A. Savary, BP 47870, 21078 Dijon Cedex, France
3Laboratoire de Physico-Chimie des Matériaux Luminescents, UMR 5620, CNRS – Université Lyon I, 10 rue A.M. Ampère, 69622 Villeurbanne Cedex, France

Tài liệu tham khảo

Samaonov, 1973 Erbil, 1992, J. Cryst. Growth, 124, 684, 10.1016/0022-0248(92)90536-R Zhai, 1996, Thin Solid Films, 277, 147, 10.1016/0040-6090(95)08006-6 Löbl, 1994, Thin Solid Films, 251, 72, 10.1016/0040-6090(94)90843-5 Leinen, 1994, J. Vac. Sci. Technol. A, 12, 2728, 10.1116/1.579096 Sorek, 1993, Appl. Phys. Lett., 63, 3256, 10.1063/1.110166 Giovanni, 1994, Thin Solid Films, 239, 186, 10.1016/0040-6090(94)90849-4 Chen, 1995, Appl. Phys. Lett., 66, 1608, 10.1063/1.113867 Lee, 1995, Jpn. J. Appl. Phys., 34, 808, 10.1143/JJAP.34.808 Kumashiro, 1993, J. Ceram. Soc. Jpn., 101, 514, 10.2109/jcersj.101.514 Han, 1998, J. Korean Phys. Soc., 32, S1538 Liu, 2001, Appl. Surf. Sci., 174, 35, 10.1016/S0169-4332(01)00007-1 Marco de Lucas, 2000, Int. J. Inorg. Mater., 2, 255, 10.1016/S1466-6049(99)00061-6 Arthur, 1967, J. Phys. Chem. Solids, 28, 2257, 10.1016/0022-3697(67)90251-X Babelon, 1997 Moret, 2000, Thin Solid Films, 366, 8, 10.1016/S0040-6090(00)00862-2 Oshaka, 1978, J. Raman Spectrosc., 7, 321, 10.1002/jrs.1250070606 Balachandran, 1982, J. Solid State Chem., 42, 276, 10.1016/0022-4596(82)90006-8 Babelon, 1998, Thin Solid Films, 322, 63, 10.1016/S0040-6090(97)00958-9