The Production of Highly Dispersed Structures under Conditions of Efflux and Relaxation of the Plasma of Jets of a Diaphragm Discharge in Vacuum

Pleiades Publishing Ltd - Tập 40 - Trang 626-628 - 2002
E. V. Kalashnikov1, S. N. Rachkulik1
1Research Institute for Integrated Testing of Optoelectronic Devices (NIIKI OEP), Sosnovyi Bor, Russia

Tài liệu tham khảo

Kalashnikov, E.V., Teplofiz. Vys. Temp., 1995, vol. 33, no. 3, p. 340 (High Temp. (Engl. transl.), vol. 33, no. 3, p. 339). Kalashnikov, E.V. and Kostitsyna, T.G., Teplofiz. Vys. Temp., vol. 38, no. 2, p. 176 (High Temp. (Engl. transl.), vol. 38, no. 2, p. 176). Smirnov, B.M., Usp. Fiz. Nauk, 1964, vol. 164, no. 7, p. 665. Mikhailov, E.F. and Vlasenko, S.S., Usp. Fiz. Nauk, 1995, vol. 165, issue 3, p. 263. Mikhailov, E.F. and Vlasenko, S.S., Khim. Fiz., 1991, vol. 9, no. 11, p. 1017.