Temperature and frequency dependent electrical and dielectric properties of Al/SiO2/p-Si (MOS) structure

Microelectronic Engineering - Tập 81 Số 1 - Trang 140-149 - 2005
İlbilge Dökme1, Ş. Altındal1, M.M. Bülbül1
1Physics Department, Faculty of Arts and Sciences, Gazi University, 06500 Teknikokullar, Ankara, Turkey

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