TOF–LEIS analysis of ultra thin films: Ga and Ga-N layer growth on Si(1 1 1)

Surface Science - Tập 566 - Trang 885-889 - 2004
Miroslav Kolı́bal1, Stanislav Průša1, Petr Bábor1, Tomáš Šikola1
1Institute of Physical Engineering, Brno University of Technology, Technicka 2, 616 69 Brno, Czech Republic

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