Subband structure and mobility of two-dimensional holes in strained Si/SiGe MOSFET’s

American Physical Society (APS) - Tập 58 Số 15 - Trang 9941-9948
R. Oberhuber1, G. Zandler1, P. Vogl1
1Physik-Department and Walter Schottky Institut, Technische Universität München, Am Coulombwall, D-85748 Garching, Germany

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