Structure, morphology and optical properties of nanocrystalline yttrium oxide (Y2O3) thin films

Optical Materials - Tập 34 Số 5 - Trang 893-900 - 2012
V.H. Mudavakkat1, Victor V. Atuchin∥⊥2, В. Н. Кручинин2, A. Kayani3, C.V. Ramana4
1University of Texas at El Paso
2RAS - Institute of Semiconductor Physics, Siberian Branch
3Department of Physics, Western Michigan University, Kalamazoo MI-49008, USA
4Department of Mechanical Engineering, University of Texas at El Paso, El Paso, TX 79968, USA

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Tài liệu tham khảo

Wilk, 2001, J. Appl. Phys., 89, 5243, 10.1063/1.1361065

Niinistö, 2004, Chem. Mater., 16, 2953, 10.1021/cm040145v

Kwo, 2000, Appl. Phys. Lett., 77, 130, 10.1063/1.126899

Paumier, 2002, Cryst. Eng., 5, 169, 10.1016/S1463-0184(02)00026-6

de Rouffignac, 2005, Chem. Mater., 17, 4808, 10.1021/cm050624+

Gordon, 2007, J. Phys. Chem. C, 111, 3233, 10.1021/jp0650376

Zhang, 1998, J. Appl. Phys., 83, 3842, 10.1063/1.366615

Zhao, 2009, Appl. Phys. Lett., 94, 042901, 10.1063/1.3075954

Rastogi, 2001, Semicond. Sci. Technol., 16, 641, 10.1088/0268-1242/16/8/301

Cho, 2007, Thin Solid Films, 515, 3373, 10.1016/j.tsf.2006.09.029

Lau, 1989, Appl. Phys. Lett., 54, 338, 10.1063/1.101450

Chiam, 2008, J. Appl. Phys., 103, 083702, 10.1063/1.2904928

Cannas, 2003, J. Mater. Chem., 13, 3079, 10.1039/B305992H

Ekambaram, 2005, J. Alloys Compd., 393, 81, 10.1016/j.jallcom.2004.10.015

Mercier, 2004, J. Appl. Phys., 96, 650, 10.1063/1.1756690

Hsu, 2006, J. Electrochem. Soc., 153, G934, 10.1149/1.2337846

Pan, 2008, Appl. Phys. Lett., 23, 183510, 10.1063/1.3021360

Tan, 2004, IEEE Trans. Electron. Dev., 51, 1143, 10.1109/TED.2004.829861

Gaboriaud, 2001, Thin Solid Films, 400, 106, 10.1016/S0040-6090(01)01468-7

Minami, 2002, Thin Solid Films, 411, 161, 10.1016/S0040-6090(02)00206-7

Ramana, 2011, Appl. Phys. Lett., 98, 031905, 10.1063/1.3524202

Mudavakkat, 2011, Thin Solid Films, 519, 7947, 10.1016/j.tsf.2011.04.222

Lacroix, 2011, Phys. Rev. B, 84, 014104, 10.1103/PhysRevB.84.014104

Swamy, 1999, J. Mater. Res., 14, 456, 10.1557/JMR.1999.0065

O’Connor, 1969, Acta Crystallogr. B, 25, 2140, 10.1107/S0567740869005255

Lou, 2001, Opt. Mater., 18, 331, 10.1016/S0925-3467(01)00172-0

Shim, 2007, Chem. Mater., 19, 3850, 10.1021/cm070913t

Huang, 2007, J. Electrochem. Soc., 154, B20, 10.1149/1.2372592

Wang, 2001, T. Am. Nucl. Soc., 84, 103

Zhu, 2002, Appl. Phys. Lett., 80, 4327, 10.1063/1.1482784

Zhu, 2002, Mater. Res. Soc. Proc., 713, JJ11, 10.1557/PROC-713-JJ11.11

Xiang, 2006, Nucl. Instrum. Methods, 250, 382, 10.1016/j.nimb.2006.04.142

Lu, 2007, J. Alloys Compd., 433, 140, 10.1016/j.jallcom.2006.06.037

Gibbons, 2001, J. Vac. Sci. Technol. A, 19, 584, 10.1116/1.1351054

Vyas, 1993, J. Cryst. Growth, 130, 59, 10.1016/0022-0248(93)90836-L

Fukumoto, 1989, Appl. Phys. Lett., 55, 360, 10.1063/1.102420

Sharma, 1991, Thin Solid Films, 1, 1, 10.1016/0040-6090(91)90045-Y

Gao, 1999, Appl. Phys. Lett., 75, 2223, 10.1063/1.124971

Jones, 1997, Appl. Phys. Lett., 71, 404, 10.1063/1.119551

Zhang, 1998, J. Appl. Phys., 83, 3842, 10.1063/1.366615

Korzenski, 2000, Chem. Mater., 12, 3139, 10.1021/cm001094e

Hou, 2007, Rare Met., 26, 103, 10.1016/S1001-0521(07)60168-5

Kim, 2005, Physica C, 426, 926, 10.1016/j.physc.2005.02.085

Horng, 1996, Thin Solid Films, 289, 234, 10.1016/S0040-6090(96)08907-9

Evangelou, 2003, J. Appl. Phys., 94, 318, 10.1063/1.1580644

Bakovets, 2002, Inorg. Mater., 38, 371, 10.1023/A:1015110023168

Selvakumar, 2009, Mater. Lett., 63, 2710, 10.1016/j.matlet.2009.09.050

Niu, 2003, J. Electrochem. Soc., 150, F102, 10.1149/1.1566415

Barve, 2010, Surf. Coat. Technol., 204, 3167, 10.1016/j.surfcoat.2010.03.003

Gougousi, 2008, Thin Solid Films, 516, 6197, 10.1016/j.tsf.2007.11.104

Cullity, 2001

M. Mayer, SIMNRA User’s Guide, Technical Report IPP 9/113, Max-Planck-Institut fur Plasmaphysik, Garching, Germany, (1997).

Ramana, 2008, Appl. Phys. Lett., 92, 011917, 10.1063/1.2811955

Jellison, 1998, Thin Solid Films, 13, 33, 10.1016/S0040-6090(97)00765-7

Fujiwara, 2007

Atuchin, 2009, Opt. Spectr., 106, 72, 10.1134/S0030400X09010093

Ramana, 2005, Chem. Mater., 17, 1213, 10.1021/cm048507m

Kalidindi, 2011, ACS Appl. Mater. Int., 3, 863, 10.1021/am101209d

Kittel, 1968

Gaboriaud, 2000, J. Phys. D. Appl. Phys., 33, 2884, 10.1088/0022-3727/33/22/304

Aspnes, 1985

Wooten, 1972

Nigara, 1968, Jpn. J. Appl. Phys., 17, 404, 10.1143/JJAP.7.404

Malandrino, 2008, J. Phys. Chem. B, 112, 9595

Toro, 2004, J. Phys. Chem. B, 108, 16357, 10.1021/jp048083j

Gullapalli, 2010, Appl. Phys. Lett., 96, 171903, 10.1063/1.3421540

Ramana, 1997, Thin Solid Films, 305, 219, 10.1016/S0040-6090(97)00141-7

Giorgi, 2009, Phys. Rev. B, 79, 235308, 10.1103/PhysRevB.79.235308

Kamala Bharathi, 2011, Chem. Phys. Lett., 540, 202, 10.1016/j.cplett.2011.02.003