Structural, electrical and optical properties of indium tin oxide films prepared by low-energy oxygen-ion-beam assisted deposition

Elsevier BV - Tập 206 - Trang 348-352 - 2003
C. Liu1,2, T. Matsutani1, T. Asanuma1, M. Kiuchi1
1National Institute of Advanced Industrial Science and Technology, AIST Kansai, Ikeda 563-8577, Japan
2Department of Physics, Wuhan University, Wuhan 430072, China

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