Spectroscopic ellipsometry measurements of the diamond-crystalline Si interface in chemically vapour-deposited polycrystalline diamond films

Diamond and Related Materials - Tập 2 - Trang 728-731 - 1993
J. Cifre1, J. Campmany1, E. Bertran1, J. Esteve1
1Department Fisica Aplicada i Electrònica, Universitat de Barcelona, Avenida Diagonal 645–647, E-08028 Barcelona Spain

Tài liệu tham khảo

Collins, 1989, Thin Solid Films, 181, 565, 10.1016/0040-6090(89)90525-7 Cong, 1991, Appl. Phys. Lett., 58, 819, 10.1063/1.104499 Cong, 1991, J. Vac. Sci. Technol. A, 9, 1123, 10.1116/1.577588 Hayashi, 1992, Appl. Phys. Lett., 60, 2868, 10.1063/1.106827 Cifre, 1992, Diamond Relat. Mater., 1, 500, 10.1016/0925-9635(92)90152-E Canillas, 1989, Vacuum, 39, 785, 10.1016/0042-207X(89)90037-7 Azzam, 1989 Bruggeman, 1935, Ann. Phys. (Lpz.), 24, 636, 10.1002/andp.19354160705 Gheeraert, 1992, Diamond Relat. Mater., 1, 504, 10.1016/0925-9635(92)90153-F