Some new aspects in the chemistry of halogenated oxyl and peroxyl radicals

Radiation Physics and Chemistry - Tập 65 - Trang 299-307 - 2002
Roman Flyunt1,2, Oksana Makogon2, Klaus-Dieter Asmus3
1Institut für Oberflächenmodifizierung IOM e,V., Permoserstr. 15, 04318 Leipzig, Germany
2Institute of Physico-Chemistry, National Academy of Science of the Ukraine, Naukova Street 3a, UA-79053 L’viv, Ukraine
3Faculty of Chemistry, Adam Mickiewicz University, Grunwaldzka 6, 60-780 Poznan, Poland

Tài liệu tham khảo

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