Simulation of microwave plasmas concentrated on the top surface of a diamond substrate with finite thickness

Diamond and Related Materials - Tập 15 - Trang 1383-1388 - 2006
Hideaki Yamada1, Akiyoshi Chayahara1, Yoshiaki Mokuno1, Yuji Horino1, Shinichi Shikata1
1Diamond Research Center, National Institute of Advanced Industrial Science and Technology (AIST), 1-8-31 Midorigaoka, Ikeda, Osaka 563-8577, Japan

Tài liệu tham khảo

Chayahara, 2004, Diamond Relat. Mater., 13, 1954, 10.1016/j.diamond.2004.07.007 Chayahara, 2004 Y. Mokuno, A. Chayahara, Y. Soda, Y. Horino, and N. Fujimori, the 10th International Conference on New Diamond Science and Technology (ICNDST-10), Tsukuba, Japan, May 11–14, 2005; “Synthesizing single-crystal diamond by repetition of high rate homoepitaxial growth by microwave plasma CVD”, to be published in Diamond and Related Materials. Füner, 1995, Surf. Coat. Technol., 74–75, 221, 10.1016/0257-8972(95)08232-8 Füner, 1999, Surf. Coat. Technol., 116–119, 853, 10.1016/S0257-8972(99)00233-9 Ralchenko, 1999, Diamond Relat. Mater., 8, 189, 10.1016/S0925-9635(98)00427-0 Celii, 1992, Thin Solid Films, 212, 140, 10.1016/0040-6090(92)90512-A H. Yamada, A. Chayahara, Y. Mokuno, Y. Horino and N. Fujimori, “Numerical analysis of power absorption and gas pressure dependence of microwave plasma using a tractable plasma description”, to be published in Diamond and Related Materials. Hyman, 1991, Surf. Coat. Technol., 49, 387, 10.1016/0257-8972(91)90088-E Tan, 1994, J. Vac. Sci. Technol., A, 12, 1216, 10.1116/1.579298 Tan, 1995, Diamond Relat. Mater., 4, 1145, 10.1016/0925-9635(95)00291-X Hassouni, 1999, J. Appl. Phys., 86, 134, 10.1063/1.370710 H. Yamada, A. Chayahara, Y. Mokuno, Y. Soda, Y. Horino and N. Fujimori, “Modeling and numerical analyses of microwave plasmas for optimizations of a reactor design and its operating conditions”, to be published in Diamond and Related Materials. Gorvachev, 2001, Diamond Relat. Mater., 10, 342, 10.1016/S0925-9635(00)00503-3 H. Yamada, A. Chayahara, Y. Mokuno, Y. Horino, and S. Shikata, “Numerical analyses of a microwave plasma chemical vapor deposition reactor for thick diamond syntheses”, to be published in Diamond and Related Materials. JMAG-Studio, Japan Research Institute, Ltd., http://www.jri.co.jp/pro-eng/jmag/index.html. SolidWorks, SolidWorks Corporation, http://www.solidworks.com. Seki Technotron Corp., http://www.sekitech.biz/.