Simulation of exposure of light-sensitive layers: Processes involving reversible reactions
Tóm tắt
Analytic expressions relating the concentration of a light-sensitive component and the intensity of exposure UV light to the sample thickness and exposure time of light-sensitive materials with the restricted mobility of reactants were found. The processes of image formation were considered, which involve the following reversible photochemical reactions: (1) both steps are photochemical,
$$A\underset{{\phi _2 }}{\overset{{\phi _1 }}{\longleftrightarrow}}B$$
; (2) a thermal reaction acts as a reversible step,
$$A\underset{k}{\overset{\phi }{\longleftrightarrow}}B$$
; and (3) both thermal and photochemical reactions are reversible steps,
$$A\underset{{\phi _2 k}}{\overset{{\phi _1 }}{\longleftrightarrow}}B$$
.
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