Simulation of exposure of light-sensitive layers: Processes involving reversible reactions

High Energy Chemistry - Tập 39 - Trang 179-183 - 2005
S. V. Zelentsov1, I. V. Simdyanov1
1Nizhni Novgorod State University, Nizhni Novgorod, Russia

Tóm tắt

Analytic expressions relating the concentration of a light-sensitive component and the intensity of exposure UV light to the sample thickness and exposure time of light-sensitive materials with the restricted mobility of reactants were found. The processes of image formation were considered, which involve the following reversible photochemical reactions: (1) both steps are photochemical, $$A\underset{{\phi _2 }}{\overset{{\phi _1 }}{\longleftrightarrow}}B$$ ; (2) a thermal reaction acts as a reversible step, $$A\underset{k}{\overset{\phi }{\longleftrightarrow}}B$$ ; and (3) both thermal and photochemical reactions are reversible steps, $$A\underset{{\phi _2 k}}{\overset{{\phi _1 }}{\longleftrightarrow}}B$$ .

Tài liệu tham khảo

Zelentsov, S.V. and Simdyanov, I.V., Zh. Nauchn. Prikl. Fotogr. Kinematogr., 2003, vol. 48, no.2, p. 52. Fotokhimicheskie protsessy v sloyakh (Photochemical Prosecces in Layers), El’tsov, A.V., Ed., Leningrad: Khimiya, 1978. Mauser, H., Z. Naturforsch., B: Chem. Sci., 1967, vol. 22b, no.4, p. 367. Mauser, H., Z. Naturforsch., B: Chem. Sci., 1967, vol. 22b, no.4, p. 371. Mauser, H., Z. Naturforsch., B: Chem. Sci., 1967, vol. 22b, no.5, p. 465. Mauser, H., Z. Naturforsch., B: Chem. Sci., 1967, vol. 22b, no.5, p. 469. Simmons, E.L., J. Phys. Chem, 1971, vol. 75, no.4, p. 588. Ashcheulov, Yu.V. and Sukhanov, V.K., Opt. Spektrosk., 1973, vol. 34, no.2, p. 356. Zelentsov, S.V., Aranson, S.Kh., and Beliakov, L.A., J. Math. Chem., 2003, vol. 33, no.1, p. 39. Slack, C.T., Opt. Acta, 1970, vol. 17, no.7, p. 547. Pimienta, V., Froute, C., Deniel, M.H., Lavabre, D., Guglielmetti, R., and Micheau, J.C., J. Photochem. Photobiol., A, 1999, vol. 122, no.3, p. 199.