Removal of high-dose P+ ion-implanted photoresist on GaAs in the mixture of dimethyl sulfoxide and acetonitrile

Journal of Industrial and Engineering Chemistry - Tập 77 - Trang 230-237 - 2019
Eunseok Oh1, Sangwoo Lim1
1Department of Chemical and Biomolecular Engineering, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul 03722, Republic of Korea

Tài liệu tham khảo

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