Reactive ion etching of quartz and silica-based glasses in CF4/CHF3 plasmas

Steinbruchel C, Lehmann H, Frick K. J Electrochem Soc 1985;132(1):180. Harrison, 1993, Science, 261, 895, 10.1126/science.261.5123.895 Mikolas, 1994, J Vac Sci Technol B, 12, 20, 10.1116/1.587185 Pierrat, 1996, J Vac Sci Technol, 14, 6, 10.1116/1.588435 Steinbruchel, 1983, J Electrochem Soc, 130, 648, 10.1149/1.2119774 Steinbruchel, 1989, Appl Phys Lett, 55, 1960, 10.1063/1.102336 Muri, 1991, Mater Res Soc Proc, 223, 41, 10.1557/PROC-223-41 Leech, 1998, J Vac Sci Technol, 16, 2037, 10.1116/1.581307 Oehrlein, 1994, J Vac Sci Technol A, 12, 333, 10.1116/1.578877 Constantine, 1997, Micromach Dev, 2, 12 Darbyshire, 1986, Vacuum, 36, 55, 10.1016/0042-207X(86)90270-8 Ronggui, 1991, J Vac Sci Technol A, 9, 2709, 10.1116/1.577229 Heraeus Amersil Inc., Data Sheet: Quartz glass for optics: optical properties, 1994.