Properties of RF magnetron sputtered indium tin oxide thin films on externally unheated glass substrate

Indium tin oxide (ITO) thin films were deposited by radio frequency (RF) magnetron sputtering onto glass substrates. The transparent and conducting ITO thin films were obtained on externally unheated glass substrate, without any post-heat treatment, and by varying the deposition process parameters such as the working pressure and the RF Power. The effect of the variation of the above deposition parameters on the structural, surface morphology, electrical, and optical properties of the thin films have been studied. A minimum resistivity of 2.36 × 10−4 Ω cm and 80% transmittance with a figure of merit 37.2 × 10−3 Ω−1 is achieved for the thin films grown on externally unheated substrate with 75 W RF power and 0.5 mTorr working pressure.