Properties of Boron Nitride (BxNy) Films Produced by the Spin‐Coating Process of Polyborazine

Journal of the American Ceramic Society - Tập 83 Số 11 - Trang 2681-2683 - 2000
Joong‐Gon Kho1, Kyo‐Tae Moon1, Jong‐Hee Kim1,2, Dong‐Pyo Kim1,3
1Department of Industrial Chemistry, Chungnam National University, Taejon 305-764, Korea
2Research Center for Advanced Magnetic Materials, Chungnam National Univer-sity, Taejon 305-764, Korea.
3*Member, American Ceramic Society.

Tóm tắt

Boron‐rich boron nitride (BN) films have been prepared on Si and SiO2/Si substrates by the vacuum pyrolysis of spin‐coated polyborazine films. Physical properties of the prepared films such as film strength, thermal conductivity, and dielectrics were determined. The BN films vacuum‐pyrolyzed at 900°C showed residual N–H bonds with a 0.75 N/B ratio, interdiffusion phenomena, and preferred orientation at the interfacial zone. Hardness and the elastic modulus of the film increased to 1.6 GPa and 50 GPa by nanoindentation loading. It had a thermal conductivity of 134 W/(m·K) at 296.5 K, and a dielectric constant in the range of 5–7, with tan ∂ between 0.01 and 0.47, depending on the film thickness.

Từ khóa


Tài liệu tham khảo

C. G.Coffer “Process and Characterization of Boron Nitride Composites and Films”;Doctoral Thesis.University of Illinois Urbana IL 1995.

Weimer A. W., 1997, Carbide, Nitride and Boride Materials Sysnthesis and Processing, 589, 10.1007/978-94-009-0071-4

10.1021/cr00099a004

10.1016/0040-6090(88)90008-9

Paine R. T., 1994, Borazine Based Polymers Closed in on Commercial Performance, Chemtech., 24, 29

10.1111/j.1151-2916.1976.tb10975.x

10.1021/cm00033a006

10.1557/JMR.1996.0045

10.1021/ic00108a039

Moon K. T., 1998, A Route to Boron Nitride via Simply Prepared Borazine Precursor, Bull. Korean Chem. Soc., 19, 222

10.1103/PhysRevB.50.6077

Colombo P., 1997, Synthesis of Silicon Carbide Thin Films with Polycabosialne (PCS), J. Am. Ceram. Soc., 80, 2333, 10.1111/j.1151-2916.1997.tb03124.x

10.1007/BF01174496

10.1016/0040-6090(94)06464-4

10.1016/0040-6090(94)90298-4

10.1016/0008-6223(94)00163-T

10.1021/cm00040a011

D. P.Kim J. G.Kho andG.Nouet “Thick Boron Nitride Film Prepared by Single Spin‐Coating Process of Polymeric PrecursorThin Solid Films unpublished work.

10.1111/j.1151-2916.1995.tb08850.x

Davis R. F., 1995, Chemical Vapor Deposition of Refractory Metals and Ceramics III, 139

10.1103/PhysRevB.46.3362

10.1109/33.56173

Thông tin
Thông tin xuất bản

Journal of the American Ceramic Society

Tập 83 Số 11

2681-2683

Thông tin tác giả