Plasma immersion ion implantation—a fledgling technique for semiconductor processing

Materials Science and Engineering: R: Reports - Tập 17 - Trang 207-280 - 1996
Paul K. Chu1, Shu Qin2, Chung Chan2, Nathan W. Cheung3, Lawrence A. Larson4
1Department of Physics and Materials Science, City University of Hong Kong, 83 Tat Chee Avenue, Kowloon, Hong Kong
2Department of Electrical and Computer Engineering, Northeastern University, Boston, MA 02115, USA
3Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, CA 94720, USA
4SEMATECH, 2706 Montopolis Drive, Austin, TX 78741-6499, USA

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Materials Science and Engineering: R: Reports

Tập 17

207-280

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