Oxygen vacancies in amorphous silica: structure and distribution of properties

Microelectronic Engineering - Tập 80 - Trang 292-295 - 2005
P.V. Sushko1, S. Mukhopadhyay1, A.M. Stoneham1, A.L. Shluger1
1Department of Physics and Astronomy, University College London, Gower Street, London WC1E 6BT, UK

Tài liệu tham khảo

Fleetwood, 2002, IEEE Trans. Nucl. Sci., 49, 2674, 10.1109/TNS.2002.805407 V.B. Sulimov, P.V. Sushko, A.H. Edwards, A.L. Shluger, and A.M. Stoneham, Phys. Rev. B 66 (2002) 024108. S. Mukhopadhyay, P.V. Sushko, A.M. Stoneham, and A.L. Shluger, Phys. Rev. B 70 (2004) 195203. Griscom, 1986, Phys. Rev. B, 34, 7524, 10.1103/PhysRevB.34.7524 Pineda, 2000, J. Phys. Chem., 104, 4699, 10.1021/jp994160c Mukhopadhyay, 2005, J. Phys.: Condens. Matter, 17, 1311 Rudra, 1987, Phys. Rev. B, 35, 8223, 10.1103/PhysRevB.35.8223 Courtot-Descharles, 1999, J. Non-Cryst. Solids, 245, 154, 10.1016/S0022-3093(98)00860-6