S. Imanishi1, M. Takeda1, M. Yamamoto1, N. Mukai1, K. Takagi1, T. Kono1
1Nano-lithography Section, Department 2, Optical Disc Development Division, AV/IT Development Group, Sony Corporation, Shinagawa, Tokyo, Japan
Tóm tắt
We developed a near-field recording process with a 266 nm blue-violet laser and an objective lens of 1.35 NA. A two-stage servo with air suspension and PZT control sufficiently constrained the gap fluctuation between the supersphere solid immersion lens (SIL) and the glassmaster. As a result, the expected small size of the pit pattern was obtained. We expect that this breakthrough will be refined much more and improve the density of optical recording.