Near- and Mid-Infrared Spectroscopy of Sol-Gel Derived Ormosil Films for Photonics from Tetramethoxysilane and Trimethoxysilylpropylmethacrylate
Tóm tắt
Ormosil dipped thin films and cast films were prepared using tetramethoxysilane and trimethoxysilylpropylmethacrylate (TMSPM). Structural changes during thermally induced polymerisation of the organic groups were investigated using near- and mid-infrared (IR) spectroscopy. IR spectra of the ormosil dipped thin films, dried at 60°C, have shown that further heat-treatment of the films at 160°C leads to the free radical polymerisation of C=C bonds in TMSPM. In the mid-infrared spectra, the intensity of the band at around 3500 cm−1, due to O–H bonds, increased with the progress of polymerisation of vinyl groups. Near-infrared spectra of the cast films showed that this increase in intensity of the O–H band is due to the increase of monomeric water molecules hydrogen bonded to silanols. We suggest that optical loss measurements must be made in a dry atmosphere or, with a cover coating to protect the ormosil from adsorption of water, to reduce this source of optical loss for waveguides based on TMSPM.
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