Morphology dependent electrochemical performance of sputter deposited Sn thin films

Hamon, 2001, J. Power Sources, 185, 97

Tamura, 2002, J. Power Sources, 107, 48, 10.1016/S0378-7753(01)00979-X

Poizot, 2000, Nature, 407, 4969, 10.1038/35035045

Kepler, 1999, Electrochem. Solid-State Lett., 2, 307, 10.1149/1.1390819

Wang, 2000, J. Alloys Compd., 299, L12, 10.1016/S0925-8388(99)00804-X

Xia, 2001, J. Electrochem. Soc., 148, A471, 10.1149/1.1362542

Beattie, 2003, J. Electrochem. Soc., 150, A894, 10.1149/1.1577336

Larcher, 2000, J. Electrochem. Soc., 147, 1658, 10.1149/1.1393413

Chiu, 2007, J. Electrochem. Soc., 154, A433, 10.1149/1.2712830

Ehrlich, 2000, J. Electrochem. Soc., 147, 886, 10.1149/1.1393287

Mukaido, 2003, Electrochem. Solid-State Lett., 6, A218, 10.1149/1.1602331

Kim, 2003, Solid State Ionics, 160, 235, 10.1016/S0167-2738(03)00185-1

Mao, 1999, Electrochem. Solid-State Lett., 2, 3, 10.1149/1.1390715

Mao, 1999, J. Electrochem. Soc., 146, 414, 10.1149/1.1391623

Chiu, 2006, J. Electrochem. Soc., 153, A920, 10.1149/1.2184923

Park, 2009, Electrochem. Commun., 11, 2165, 10.1016/j.elecom.2009.09.021

Wang, 2004, J. Electrochem. Soc., 151, A563, 10.1149/1.1647571

Takamura, 1999, J. Power Sources, 81–82, 368, 10.1016/S0378-7753(98)00220-1

2008

Kim, 2006, Electrochem. Soc. Interface, 28, 10.1149/2.F06063IF