Microstructural and electrical characteristics of reactively sputtered ZrNx thin films

Huang, 2007, Mater. Chem. Phys., 102, 31, 10.1016/j.matchemphys.2006.10.007 Hultman, 2000, Vacuum, 57, 1, 10.1016/S0042-207X(00)00143-3 Tanaka, 1993, Thin Solid Films, 228, 238, 10.1016/0040-6090(93)90607-Q McIntyre, 1990, J. Appl. Phys., 67, 1542, 10.1063/1.345664 Wang, 1995, J. Mater. Sci., 30, 1627, 10.1007/BF00351591 van Leaven, 1992, Surf. Coat. Technol., 53, 25, 10.1016/0257-8972(92)90100-O Takeyama, 2000, J. Vac. Sci. Technol. B, 18, 1333, 10.1116/1.591382 Takeyama, 2002, Appl. Surf. Sci., 190, 450, 10.1016/S0169-4332(01)00916-3 Westlinder, 2005, Solid-State Electron., 49, 1410, 10.1016/j.sse.2005.06.021 Mitterer, 1998, Surf. Coat. Technol., 108/109, 230, 10.1016/S0257-8972(98)00651-3 Yoshitake, 1992, Jpn. J. Appl. Phys., 31, 4002, 10.1143/JJAP.31.4002 Benia, 2002, Appl. Surf. Sci., 200, 231, 10.1016/S0169-4332(02)00925-X Gruss, 1998, Surf. Coat. Technol., 107, 115, 10.1016/S0257-8972(98)00584-2 Pichon, 1999, Appl. Surf. Sci., 150, 115, 10.1016/S0169-4332(99)00233-0 Nakano, 2008, Vacuum, 83, 467, 10.1016/j.vacuum.2008.04.014 Easwarakhanthan, 2005, J. Appl. Phys., 98, 073531, 10.1063/1.2076444 Vila, 2005, J. Appl. Phys., 97, 113710, 10.1063/1.1915538 Vomiero, 2005, J. Appl. Phys., 97, 034905, 10.1063/1.1840104 Liu, 2003, Thin Solid Films, 444, 111, 10.1016/S0040-6090(03)01191-X Wang, 2004, J. Vac. Sci. Technol. A, 22, 2145, 10.1116/1.1776182 Habib, 1998, Vacuum, 49, 153, 10.1016/S0042-207X(97)00158-9 Ohring, 1992 Sundgren, 1983, Thin Solid Films, 105, 353, 10.1016/0040-6090(83)90318-8 Kevin, 1984, Surf. Interface Anal., 6, 261, 10.1002/sia.740060603 Yanagisawa, 1998, Jpn. J. Appl. Phys., 37, 5714, 10.1143/JJAP.37.5714 Del Re, 2003, Surf. Coat. Technol., 174/175, 240, 10.1016/S0257-8972(03)00679-0 Yoshitake, 1990, Jpn. J. Appl. Phys., 29, 2800, 10.1143/JJAP.29.2800 Gribaudo, 1994, J. Phase Equilib., 15, 441, 10.1007/BF02647575 Klug, 1974 Schwarz, 1985, Phys. Rev. B, 32, 8312, 10.1103/PhysRevB.32.8312