Ion beam milling fabrication of a small off-axis ellipsoidal mirror, diffraction limited to 1 μm resolution at 14 nm

Review of Scientific Instruments - Tập 72 Số 2 - Trang 1559-1564 - 2001
Raymond Mercier1, M. Mullot1, Michel Lamare1, Jean‐Daniel Tissot1
1Institut d’Optique/SupOptique/Laboratoire Charles Fabry associé au CNRS, BP 147, 91403 Orsay Cedex, France

Tóm tắt

One interest of extreme ultraviolet wavelengths is their potentially high optical resolution. Such optics require high precision, low roughness surfaces onto which will be deposed adequate multilayers giving near-normal incidence reflection. For a spatially resolved interferometer, we have manufactured and tested with a reasonable degree of confidence an 8×8 mm off-axis ellipsoidal mirror, below the diffraction limit for a 14 nm wavelength. The ion beam milling technique employed for the fabrication allows to preserve the low roughness of the initial spherical substrate, and although we only achieved a 0.4 nm root-mean-square roughness, better could easily be done. At these precisions, testing is as important and as difficult as the figuring itself. The resulting mirror combines high theoretical resolution (1 μm) over a large object field (∼1 mm in diameter).

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Tài liệu tham khảo

1998, Proc. SPIE, 3404, 376, 10.1117/12.308642

1999, Rev. Sci. Instrum., 70, 2921, 10.1063/1.1149851

1997, Proc. SPIE, 3156, 124, 10.1117/12.284821

1995, Phys. Rev. Lett., 74, 3991, 10.1103/PhysRevLett.74.3991

1999, Proc. SPIE, 3739, 155, 10.1117/12.360139

1997, Pure Appl. Opt., 6, 773, 10.1088/0963-9659/6/6/019

1985, Proc. SPIE, 563, 275, 10.1117/12.949677

2000, Rev. Sci. Instrum., 71, 2635, 10.1063/1.1150668

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Review of Scientific Instruments

Tập 72 Số 2

1559-1564

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