Influence of stacking faults on the quality of GaN films grown on sapphire substrate using a sputtered AlN nucleation layer
Tài liệu tham khảo
Nakamura, 1995, Jpn. J. Appl. Phys., 34, L797, 10.1143/JJAP.34.L797
Takashi, 1999, Jpn. J. Appl. Phys, 38, 3976, 10.1143/JJAP.38.3976
Asif Khan, 1992, Appl. Phys. Lett., 60, 3027, 10.1063/1.106798
Sakai, 1997, Appl. Phys. Lett., 71, 2259, 10.1063/1.120044
Kapolnek, 1997, Appl. Phys. Lett., 71, 1204, 10.1063/1.119626
Tsvetanka, 1997, Appl. Phys. Lett., 71, 2472, 10.1063/1.120091
Jiang, 2016, Sci. Rep., 6, 19955, 10.1038/srep19955
Lo, 2009, Appl. Phys. Lett., 95, 211103, 10.1063/1.3266859
Lee, 2006, IEEE Photonic. Technol. Lett., 18, 1152, 10.1109/LPT.2006.874737
Li-Chuan, 2014, Electron Devices, IEEE Trans. Electron Devices, 61, 2443
Lai, 2013, J. Disp. Technol., 9, 895, 10.1109/JDT.2013.2264455
Gay, 1954, Inst. Appl. Math. Res., 7, 41
Romano, 1997, Appl. Phys. Lett., 71, 2283, 10.1063/1.120051
Lin, 2014, Appl. Phys. Lett., 105, 082114, 10.1063/1.4894632
Lee, 2011, Appl. Phys. Lett., 99, 211901, 10.1063/1.3658451
Amano, 1986, Appl. Phys. Lett., 48, 353, 10.1063/1.96549
Han, 1997, Appl. Phys. Lett., 71, 3114, 10.1063/1.120263
Collazo, 2008, Phys. Status Solidi, 5, 1997, 10.1002/pssc.200778624
Cho, 2001, J. Appl. Phys., 89, 2617, 10.1063/1.1344213