In vitro exposure apparatus for ELF magnetic fields

Bioelectromagnetics - Tập 25 Số 8 - Trang 582-591 - 2004
Jürgen Schuderer1, Walter Oesch1, N. Felber1, D. Spat1, Niels Kuster1
1Foundation for Research on Information Technologies in Society (IT'IS), Integrated Systems Laboratory IIS, Swiss Federal Institute of Technology (ETH), Zurich, Switzerland

Tóm tắt

AbstractFor in vitro studies on the effect of extremely low frequency (ELF) magnetic field exposures in different laboratories, a programmable, high precision exposure system enabling blinded exposures has been developed and fully characterized. It is based on two shielded 4 coil systems that fit inside a commercial incubator. The volume of uniform B field exposure with 1% field tolerance is 50% larger compared to a Merrit 4 coil system with the same coil volume. The uncertainties for the applied magnetic fields have been specified to be less than 4%. The computer controlled apparatus allows signal waveforms that are composed of several harmonics, blind protocols, monitoring of exposure and environmental conditions and the application of B fields up to 3.6 mT root‐mean‐square amplitude. Sources of artifacts have been characterized: sham isolation >43 dB, parasitic incident E fields <1 V/m, no recognizable temperature differences in the media for exposure or sham state, and vibrations of the mechanically decoupled dish holder <0.1 m/s2 (= 0.01 g), which is only twice the sham acceleration background level produced by the incubator and fan vibrations. Bioelectromagnetics 25:582–591, 2004. © 2004 Wiley‐Liss, Inc.

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