In Situ Electrochemical Activation of Atomic Layer Deposition Coated MoS2Basal Planes for Efficient Hydrogen Evolution Reaction

Advanced Functional Materials - Tập 27 Số 34 - 2017
Youngmin Kim1, David H. K. Jackson2, Daewon Lee1, Min Choi3,4, Tae‐Wan Kim1, Soon‐Yong Jeong1, Ho‐Jeong Chae1, Hyun Woo Kim3, Noejung Park5, Hyunju Chang3, T. F. Kuech6,2, Hyung Ju Kim1,7
1Carbon Resources Institute, Korea Research Institute of Chemical Technology, 141 Gajeong-ro, Yuseong-gu, Daejeon, 34114 South Korea
2Materials Science Program, University of Wisconsin-Madison, 1509 University Ave., Madison, WI 53706, USA
3Center for Molecular Modeling and Simulation, Korea Research Institute of Chemical Technology, 141 Gajeong-ro, Yuseong-gu, Daejeon, 34114 South Korea
4Department of Chemistry, Ulsan National Institute of Science and Technology, 50 UNIST-gil, Banyeon-ri, Eonyang-eup, Ulju-gun, Ulsan, 44919 South Korea
5Department of Physics, Ulsan National Institute of Science and Technology, 50 UNIST-gil, Banyeon-ri, Eonyang-eup, Ulju-gun, Ulsan, 44919 South Korea
6Department of Chemical and Biological Engineering, University of Wisconsin-Madison, 1415 Engineering Dr., Madison, WI, 53706, USA
7Department of Green Chemistry and Biotechnology, University of Science and Technology, 113 Gwahangno, Yuseong, Daejeon, 34113 South Korea

Tóm tắt

Molybdenum disulfide (MoS2), which is composed of active edge sites and a catalytically inert basal plane, is a promising catalyst to replace the state‐of‐the‐art Pt for electrochemically catalyzing hydrogen evolution reaction (HER). Because the basal plane consists of the majority of the MoS2bulk materials, activation of basal plane sites is an important challenge to further enhance HER performance. Here, an in situ electrochemical activation process of the MoS2basal planes by using the atomic layer deposition (ALD) technique to improve the HER performance of commercial bulk MoS2is first demonstrated. The ALD technique is used to form islands of titanium dioxide (TiO2) on the surface of the MoS2basal plane. The coated TiO2on the MoS2surface (ALD(TiO2)‐MoS2) is then leached out using an in situ electrochemical activation method, producing highly localized surface distortions on the MoS2basal plane. The MoS2catalysts with activated basal plane surfaces (ALD(Act.)‐MoS2) have dramatically enhanced HER kinetics, resulting from more favorable hydrogen‐binding.

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Advanced Functional Materials

Tập 27 Số 34

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