High temperature coefficient of resistance molybdenum oxide and nickel oxide thin films for microbolometer applications

Kruse, 2002

10.1117/12.160553

10.1117/12.243062

2014, Uncooled detectors for thermal imaging cameras

10.1088/0022-3727/42/5/055408

10.1557/jmr.2009.0183

Bharadwaja, 2010, Processing issues in pulse DC sputtering of vanadium oxide thin films for uncooled infrared detectors, 177

10.1116/1.4894268

10.1063/1.4731240

10.1117/12.884377

10.1016/j.tsf.2004.10.051

10.1016/j.tsf.2005.05.022

10.1117/12.2016277

10.1116/1.582155

Liu, 2009, 489

10.1109/20.908643

10.1116/1.2819268

Zhurin, 2012, 278

10.1016/j.tsf.2003.11.191

10.1364/AO.30.002692

10.1103/PhysRevB.61.10832

10.1063/1.3703669

10.1149/1.2908818

10.1116/1.3328822

10.1063/1.4812587

Collins, 2005, Optical physics of materials, 159

Collins, 2005, Optical physics of materials, 125

Collins, 2005, Optical physics of materials, 129

10.1063/1.118064

10.1063/1.118155

10.1063/1.3702451

10.1063/1.4759255

10.1007/s10008-002-0285-4

10.1021/jp075835b

10.1021/jp9093172

Nirupama, 2009, Characterization of molybdenum oxide films prepared by bias magnetron sputtering, 320

10.1117/12.850243

10.1117/12.886913

10.1088/0953-8984/2/17/008

Keem, 1978, Selected electrical and thermal properties of undoped nickel oxide

10.1063/1.3081025

10.1016/0022-3697(68)90011-5

10.1063/1.4742993

10.1111/(ISSN)1551-2916

10.3938/jkps.52.1868

10.1063/1.2938697

10.1103/PhysRevB.2.3112

10.1103/PhysRevLett.53.2339

10.1016/0040-6090(93)90241-G

10.1016/j.jcrysgro.2003.10.090

10.1117/12.2053174