High-purity single-crystal monoisotopic silicon-28 for precise determination of Avogadro’s number

Doklady Chemistry - Tập 421 Số 1 - Trang 157-160 - 2008
G. G. Devyatykh1, А. Д. Буланов1, А. В. Гусев1, И. Д. Ковалев1, В. А. Крылов1, А. П. Потапов1, П. Г. Сенников1, S. A. Adamchik1, В. А. Гавва1, A. P. Kotkov1, М. Ф. Чурбанов1, E. M. Dianov2, A. K. Kaliteevskiĭ3, O. N. Godisov3, H.‐J. Pohl4, Peter Becker5, H. Riemann6, N. V. Abrosimov6
1Institute of Chemistry of High-Purity Substances, Russian Academy of Sciences, Nizhni Novgorod, Russia
2Research Center of Fiber Optics, Russian Academy of Sciences, Moscow, Russia
3Tsentrotekh-EKhZ Science and Technology Center, St. Petersburg, Russia
4VITCON Projectconsult Gmbh, Jena, Germany
5Physikalisch-Technische Bundesanstalt, Braunschweig, Germany
6Institut für Kristallzucht, Berlin, Germany

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Cohen, E.R. and Taylor, B.N., CODATA Bull., no. 63, New York: Pergamon, 1986.

Volkov, N.F. and Trubnyakov, Yu.I., Tr. Metrolog. Inst. SSSR, 1979, nos. 234/294, pp. 10–13.

Fujii, K., IEEE Trans. Instrum. Meas., 2005, vol. 54, pp. 854–859.

Becker, P., Bettin, H., Danzebrink, H.-U., et al., Metrologia, 2003, vol. 40, pp. 271–287.

Becker, P., Bettin, H., De Bievre, P., et al., IEEE Trans. Instrum. Meas., 1995, vol. 44, no. 2, pp. 522–525.

Izotopy: svoistva, poluchenie, primenenie (Isotopes: Properties, Synthesis, Application), Baranov, V.Yu, Ed., Moscow: Fizmatlit, 2005, vol. 1.

Devyatykh, G.G. and Zorin, L.D., Letuchie neorganicheskie gidridy osoboi chistoty (Ultrapure Volatile Inorganic Hydrides), Moscow: Nauka, 1974.

RF Patent No. 2 155 158, Byull. Izobret., 2000, No. 24.

Devyatykh, G.G., Dianov, E.M., Bulanov, A.D., et al., Dokl. Chem., 2003, vol. 391, nos. 4–6, pp. 204–205 [Dokl. Akad. Nauk, 2003, vol. 391, no. 5, pp. 638–639].

Devyatykh, G.G., Bulanov, A.D., Gusev, A.V., et al., Dokl. Chem., 2001, vol. 376, nos. 4–6, pp. 47–48 [Dokl. Akad. Nauk, 2001, vol. 376, no. 4, pp. 492–493].

Fal’kevich, E.S., Pul’ner, E.O., Chervonnyi, I.F., et al., Tekhnologiya poluprovodnikovogo kremniya (Technology of Semiconductor Silicon), Moscow: Metallurgiya, 1992.

Becker, P., Schiel, D., Pohl, H.-J., et al., Meas. Sci. Technol., 2006, vol. 17, pp. 1854–1860.