Gas condensation of ultrafine silicon particles using dc magnetron sputtering

Nanostructured Materials - Tập 4 - Trang 883-892 - 1994
D.H. Pearson1, A.S. Edelstein1
1Naval Research Laboratory Division of Materials Science and Technology, Code 6371 Washington, DC 20375, USA

Tài liệu tham khảo

Canham, 1990, Appl. Phys. Lett., 57, 1046, 10.1063/1.103561 Yamamoto, 1991, Jpn. J. Appl. Phys., 30, 136, 10.1143/JJAP.30.136 Takagi, 1990, Appl. Phys. Lett., 56, 2379, 10.1063/1.102921 DiMaria, 1984, J. Appl. Phys., 56, 401, 10.1063/1.333979 Furukawa, 1988, Jpn. J. Appl. Phys., 27, L2207, 10.1143/JJAP.27.L2207 Littau, 1993, J. Phys. Chem., 97, 1224, 10.1021/j100108a019 Saito, 1979, J. Cryst. Growth, 47, 61, 10.1016/0022-0248(79)90157-X Okada, 1984, Sol. State Comm., 49, 809, 10.1016/0038-1098(84)90086-3 Hayaski, 1984, Jpn. J. Appl. Phys., 23, L824, 10.1143/JJAP.23.L824 Iijima, 1987, Jpn. J. Appl. Phys., 26, 357, 10.1143/JJAP.26.357 Iijima, 1987, Jpn. J. Appl. Phys., 26, 365, 10.1143/JJAP.26.365 Hayaski, 1990, J. Appl. Phys., 68, 5300, 10.1063/1.347022 Okada, 1991, Appl. Phys. Lett., 58, 1662, 10.1063/1.105129 Furukawa, 1988, Phys. Rev. B, 38, 5726, 10.1103/PhysRevB.38.5726 Yoo, 1993, J. Vac. Sci. Technol. A, 11, 1258, 10.1116/1.578536 Littau, 1993, J. Phys. Chem., 97, 1224, 10.1021/j100108a019 Wu, 1987, J. Appl. Phys., 61, 1365, 10.1063/1.338115 Cannon, 1982, J. Am. Ceram. Soc., 65, 324, 10.1111/j.1151-2916.1982.tb10464.x Jasinski, 1991, Chem. Mater., 3, 989, 10.1021/cm00018a003 Kaatz, 1993, J. Mater. Res., 8, 995, 10.1557/JMR.1993.0995 Sputter source manufactured by US Thin Film Products, Inc. 1993 Haas, 1992, Nanostruct. Mater., 1, 491, 10.1016/0965-9773(92)90082-9 Granqvist, 1976, J. Appl. Phys., 47, 2200, 10.1063/1.322870 Chow, 1991, J. Mater. Res., 6, 8, 10.1557/JMR.1991.0008