Rahul R. Nair1, Wencai Ren2, R. Jalil1, Ibtsam Riaz1, Vasyl G. Kravets1, L. Britnell1, Peter Blake1, Fredrik Schedin1, Alexander S. Mayorov1, Shengjun Yuan3, M. I. Katsnelson3, Hui‐Ming Cheng2, Włodek Strupiński4, Lyubov G. Bulusheva5, А. В. Окотруб5, I. V. Grigorieva1, A. N. Grigorenko1, Kostya S. Novoselov1, A. K. Geǐm1
1School of Physics and Astronomy, University of Manchester, Manchester M13 9PL, U.K.
2Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, 72 Wenhua Road, Shenyang 110016, P.R. China
3Radboud University of Nijmegen, Institute for Molecules and Materials, Nijmegen, 6525 AD, The Netherlands
4Institute of Electronic Materials, Technology Wólczyn´ska 133, Warszawa 01–919, Poland
5Nikolaev Institute of Inorganic Chemistry, SB RAS, 630060 Novosibirsk, Russia
Tóm tắt
AbstractA stoichiometric derivative of graphene with a fluorine atom attached to each carbon is reported. Raman, optical, structural, micromechanical, and transport studies show that the material is qualitatively different from the known graphene‐based nonstoichiometric derivatives. Fluorographene is a high‐quality insulator (resistivity >1012 Ω) with an optical gap of 3 eV. It inherits the mechanical strength of graphene, exhibiting a Young’s modulus of 100 N m−1 and sustaining strains of 15%. Fluorographene is inert and stable up to 400 °C even in air, similar to Teflon.
