Facile fabrication of stretchable photonic Ag nanostructures by soft-contact patterning of ionic Ag solution coatings

Nanophotonics - Tập 11 Số 11 - Trang 2693-2700 - 2022
Minwook Kim1, Dong Kyo Oh2, Jeong Dae Kim1,3, Minsu Jeong2, Hongyoon Kim2, Chunghwan Jung4, Jungkeun Song1, Won‐Jun Lee1, Junsuk Rho4,2,5,6, Jong G. Ok1
1Department of Mechanical and Automotive Engineering, Seoul National University of Science and Technology, Seoul 01811, Republic of Korea
2Department of Mechanical Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea
3Etch Team, SEMES Co., Ltd. , Cheonan , Chungcheongnam-do 31040 , Republic of Korea
4Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH), Pohang, 37673, Republic of Korea
5National Institute of Nanomaterials Technology (NINT), Pohang 37673, Republic of Korea
6POSCO-POSTECH-RIST Convergence Research Center for Flat Optics and Metaphotonics, Pohang, 37673, Republic of Korea

Tóm tắt

Abstract We describe a rapid and simple method to create Ag nanostructures by using direct mechanical patterning of ionic Ag ink coating under gentle pressure, then thermal annealing to reduce the ionic Ag ink to a metallic Ag layer. The ionic liquid-phase Ag coating is easily obtained by spin-coating ionic Ag ink that has appropriate Ag concentration and can be either printed or imprinted on the desired substrate by using a soft elastomer patterning mold, then reduced to the Ag nanostructure by subsequent thermal annealing. More specifically, we present two methods: transfer printing and soft nanoimprinting. In transfer printing, the ionic Ag ink is first inked onto the elastomer mold which then contacts the target substrate to transfer the Ag nanopattern. In soft nanoimprinting, the elastomer mold conducts soft imprinting to engineer the ionic Ag ink coating to the Ag nanostructure. We systematically investigate the optimal patterning conditions by controlling the initial Ag ink concentration and the coating, printing, imprinting, and annealing conditions, to derive Ag architecture that has tunable photonic functionality. As an example, we demonstrate polarization-sensitive reflective color filters that exploit shape-tunable Ag nanostructures fabricated by soft nanoimprinting using a controllably-stretched elastomer mold.

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Nanophotonics

Tập 11 Số 11

2693-2700

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