Experimental study of copper leveling additives and their wafer and pattern-scale effect on copper planarization

Comptes Rendus Chimie - Tập 16 - Trang 15-20 - 2013
James Kelly1, Charan Surisetty1, Donald Canaperi1
1IBM Research, Albany Nanotech, 257 Fuller Road, Albany, 12203 NY, USA

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