Electrochromic behavior of NiO film prepared by e-beam evaporation

D.R. Sahu1,2, Tzu-Jung Wu3, Sheng-Chang Wang4, Jow-Lay Huang3,5
1Department of Natural and Applied Sciences, Namibia University of Science and Technology, Private Bag 13388, Windhoek, Namibia
2Department of Materials Science and Engineering, National Cheng Kung University, Tainan 701, Taiwan, ROC
3Department of Materials Science and Engineering, National Cheng-Kung University, Tainan, 701, Taiwan, ROC
4Department of Mechanical Engineering, Southern Taiwan University of Science and Technology, Tainan 710, Taiwan, ROC
5Center for Micro/Nano Science and Technology, National Cheng Kung University, Tainan 701, Taiwan, ROC

Tài liệu tham khảo

Faria, 1998, Toward efficient electrochromic NiOx films: a study of microstructure, morphology, and stoichiometry of radio frequency sputtered films, J. Electrochem. Soc., 145, 235, 10.1149/1.1838240 Michelcic, 2014, Comparison of electrochromic properties of Ni1−xO in lithium and lithium-free aprotic electrolytes: from Ni1−xO pigment coatings to flexible electrochromic devices, Sol. Energy Mater. Sol. Cells, 120, 116, 10.1016/j.solmat.2013.08.025 Browne, 2016, Electrochromic nickel oxide films for smart window applications, Int. J. Electrochem. Sci., 11, 6636, 10.20964/2016.08.38 Green, 2009, Electrochromism in nickel oxide and tungsten oxide thin films: ion intercalation from different electrolytes, Sol. Energy Mater. Sol. Cells, 93, 2050, 10.1016/j.solmat.2009.05.009 Sialvi, 2013, Electrochromic and colorimetric properties of nickel(II) oxide thin films prepared by aerosol-assisted chemical vapor deposition, ACS Appl. Mater. Interf., 5, 5675, 10.1021/am401025v Reddy, 2001, Thickness dependent properties of nickel oxide thin films deposited by dc reactive magnetron sputtering, Vacuum, 85, 949, 10.1016/j.vacuum.2011.02.002 DeLoach, 1998, Thickness-dependent crystallinity of sputter-deposited titania, J. Vac. Sci. Technol. A, 16, 1963, 10.1116/1.581204 Patil, 2000, Thickness-dependent electrochromic properties of solution thermolyzed tungsten oxide thin films, Sol. Energy Mater. Sol. Cells, 60, 143, 10.1016/S0927-0248(99)00079-3 Pereira, 2014, Electrochromic behavior of NiO thin films deposited by e-beam evaporation at room temperature, Sol. Energy Mater. Sol. Cells, 120, 109, 10.1016/j.solmat.2013.08.024 Connell, 1992, The electrochromic properties of sputtered nickel oxide films, Sol. Energy Mater. Sol. Cells, 25, 301, 10.1016/0927-0248(92)90075-Z Avendano, 2005, Proton diffusion and electrochromism in hydrated NiOy and Ni1 − xVxOy thin films, J. Electrochem. Soc., 152, F203, 10.1149/1.2077308 Vidales-Hurtado, 2008, Optical and structural characterization of nickel oxide-based thin films obtained by chemical bath deposition, Mater. Chem. Phys., 107, 33, 10.1016/j.matchemphys.2007.06.036 Moulki, 2014, Electrochromic performances of nonstoichiometric NiO thin films, Thin Solid Films, 553, 63, 10.1016/j.tsf.2013.10.154 Rocha, 2016, Electrochromism of non-stoichiometric NiO thin film: as single layer and in full device, Appl. Phys. A, 122, 3701, 10.1007/s00339-016-9923-z Kadry, 1995, Structural dependence of d.c. electrical properties of physically deposited CdTe thin films, Thin Solid Films, 269, 112, 10.1016/0040-6090(95)06869-4 Bouessay, 2002, Pulsed laser-deposited nickel oxide thin films as electrochromic anodic materials, Appl. Surf. Sci., 186, 490, 10.1016/S0169-4332(01)00755-3 Lin, 2010, Electrochromic performance of reactive plasma-sputtered NiOx thin films on flexible PET/ITO substrates for flexible electrochromic devices, Surf. Coat. Technol., 205, S216, 10.1016/j.surfcoat.2010.07.088 Xia, 2008, Electrochromic properties of porous NiO thin films prepared by a chemical bath deposition, Sol. Energy Mater. Sol. Cells, 92, 628, 10.1016/j.solmat.2008.01.009 Guziewicz, 2011, Electrical and optical properties of NiO films deposited by magnetron sputtering, Opt. Appl., XLI, 431 Cullity, 2001 Dalavi, 2011, Nanoporous nickel oxide thin films and its improved electrochromic performance: effect of thickness, Appl. Surf. Sci., 257, 2647, 10.1016/j.apsusc.2010.10.037 Huang, 2011, Electrochromic properties of porous NiO thin film as a counter electrode for NiO/WO3 complementary electrochromic window, Electrochim. Acta, 56, 4281, 10.1016/j.electacta.2011.01.078 Wu, 2000, Structural, infrared, X-ray photoelectron, and Raman spectral characterization of electrochromic nickel oxide films, vol. 4086, 418 Ahn, 2002, Surface morphological, microstructural, and electrochromic properties of short-range ordered and crystalline nickel oxide thin films, Appl. Surf. Sci., 199, 259, 10.1016/S0169-4332(02)00863-2 Md. Sultan, 2015, Analysis of reflectance and transmittance characteristics of optical thin film for various film materials, thicknesses and substrates, J. Electr. Electron. Syst., 4, 1 Mahmoud, 2002, Opto-structural, electrical and electrochromic properties of crystalline nickel oxide thin films prepared by spray pyrolysis, Physica B, 311, 366, 10.1016/S0921-4526(01)01024-9 Jimenez-Gonzalez, 2000, Deposition of NiOx thin films by sol–gel technique, Surf. Eng., 16, 73, 10.1179/026708400322911573 Hong, 2005, Influence of oxygen partial pressure on the structure and photoluminescence of direct current reactive magnetron sputtering ZnO thin films, Thin Solid Films, 473, 58, 10.1016/j.tsf.2004.06.159 Zeng, 2002, Effect of deposition conditions on optical and electrical properties of ZnO films prepared by pulsed laser deposition, Appl. Surf. Sci., 197–198, 362, 10.1016/S0169-4332(02)00425-7 Kamal, 2005, The electrochromic behavior of nickel oxide films sprayed at different preparative conditions, Thin Solid Films, 483, 330, 10.1016/j.tsf.2004.12.022 Hutchins, 1998, Optimisation of preparative and performance parameters on electrochromic properties of electrochemically deposited tungsten oxide films, Jpn. J. Appl. Phys., 77, 4812, 10.1143/JJAP.37.4812 Shinohara, 2005 Schmitt, 2001, Electrochromic properties of pure and doped Nb2O5 coatings and devices, Electrochim. Acta, 46, 2105, 10.1016/S0013-4686(01)00380-2 Bouessay, 2004, Electrochemically inactive nickel oxide as electrochromic material, J. Electrochem. Soc., 151, H145, 10.1149/1.1731584 Azens, 1998, Sputter-deposited nickel oxide for electrochromic applications, Solid State Ionics, 113–115, 449, 10.1016/S0167-2738(98)00309-9 Usiskin, 2015, Probing the reaction pathway in (La0.8Sr0.2)0.95MnO3+δ using libraries of thin film microelectrodes, J. Mater. Chem. A, 3, 19330, 10.1039/C5TA02428E Ushio, 1996, Degradation of the electrochromic nickel oxide film upon redox cycling, Thin Solid Films, 280, 233, 10.1016/0040-6090(95)08211-5 Dalavi, 2012, Efficient maximization of coloration by modification in morphology of electrodeposited NiO thin films prepared with different surfactants, J. Solid State Electrochem., 16, 253, 10.1007/s10008-011-1314-y Chiu, 2005, The electrochemical performance of bias-sputter-deposited nanocrystalline nickel oxide thin films toward lithium, J. Electrochem. Soc., 152, A1188, 10.1149/1.1906024