Effect of annealing in oxidizing atmosphere on optical and structural properties of silicon suboxide thin films obtained by gas-jet electron beam plasma chemical vapor deposition method

Vacuum - Tập 152 - Trang 319-326 - 2018
A.O. Zamchiy1, E.A. Baranov1, I.E. Merkulova2, V.A. Volodin2,3, M.R. Sharafutdinov4, S.Ya. Khmel1
1Kutateladze Institute of Thermophysics SB RAS, Ac. Lavrentiev Ave. 1, 630090, Novosibirsk, Russia
2Novosibirsk State University, Pirogova str.2, 630090 Novosibirsk, Russia
3Rzhanov Institute of Semiconductor Physics SB RAS, Ac. Lavrentiev Ave. 13, 630090 Novosibirsk, Russia
4Institute of Solid State Chemistry and Mechanochemistry SB RAS, Kutateladze str. 18, 630128 Novosibirsk, Russia

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