Dynamic electromigration modeling for transient stress evolution and recovery under time-dependent current and temperature stressing

Integration - Tập 58 - Trang 518-527 - 2017
Xin Huang1, Valeriy Sukharev2, Taeyoung Kim3, Sheldon X.-D. Tan1
1Department of Electrical and Computer Engineering, University of California at Riverside, Riverside, CA 92521, USA
2Mentor Graphics Corporation, Fremont, CA 94528, USA
3Department of Computer Science and Engineering, University of California at Riverside, Riverside, CA 92521, USA

Tài liệu tham khảo

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