Depth profiling of defects in ion-implanted Ni and Fe by positron annihilation measurements

Surface and Coatings Technology - Tập 206 - Trang 834-836 - 2011
A. Kinomura1, R. Suzuki1, T. Ohdaira1, N. Oshima1, K. Ito1, Y. Kobayashi1
1National Institute of Advanced Industrial Science and Technology (AIST) 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan

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