Deposition of organic polymers at higher substrate temperatures in atmospheric pressure glow discharge

The atmospheric pressure glow discharge burning in nitrogen with small admixture of organosilicon compounds such as hexamethyldisilazane (HMDSN) or hexamethyldisiloxane (HMDSO) was used for the deposition of thin organosilicon polymer films at deposition temperatures up to 120 °C. The properties of the discharge were studied by means of optical emission spectroscopy and electrical measurements. Mechanical properties of deposited films were characterised by depth sensing indentation technique, optical properties were measured by means of ellipsometry. The films were polymer-like, transparent in visible range and without pinholes.