Deposition and characterisation of a-Si: H films prepared by reactive ion beam sputtering

Journal of Non-Crystalline Solids - Tập 101 - Trang 111-116 - 1988
Mohan Krishan Bhan1,2, Subhash C. Kashyap1,2, L.K. Malhotra1,2
1Thin Film Laboratory, Department of Physics Indian Institute of Technology, New Delhi - 110016, India
2Centre for Materials Science and Technology, Indian Institute of Technology, New Delhi - 110016, India

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Journal of Non-Crystalline Solids

Tập 101

111-116

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