Correlations between the thermoelectric power and Hall effect of Sn or Ge doped In2O3 semiconductors
Materials Science and Engineering B: Solid-State Materials for Advanced Technology - Tập 22 - Trang 274-278 - 1994
Tài liệu tham khảo
Chopra, 1983, Thin Solid Films, 102, 1, 10.1016/0040-6090(83)90256-0
Bharadwaj, 1981, Sol. Cells, 5, 39, 10.1016/0379-6787(81)90014-4
Hamberg, 1986, J. Appl. Phys., 60, 123, 10.1063/1.337534
Jin, 1988, J. Appl. Phys., 64, 5117, 10.1063/1.342419
Stjerna, 1980, Appl. Phys. Lett., 57, 1989, 10.1063/1.104150
Wen, 1992, Mater. Sci. Eng., B14, 115, 10.1016/0921-5107(92)90339-B
Wen, 1993, J. Solid State Chem., 101, 203, 10.1016/0022-4596(92)90176-V
Wen, 1992, Phys. Status Solidi A, 130, 408, 10.1002/pssa.2211300218
Campet, 1993, Mater. Sci. Eng. B, 19, 285, 10.1016/0921-5107(93)90200-7
Wen, 1992
Zhang, 1982, Inorg. Chem., 21, 3886, 10.1021/ic00141a005
Fistul, 1969
Fistul, 1969, Heavily Doped Semiconductors, 47
Fistul, 1969, Heavily Doped Semiconductors, 48
Fistul, 1969, Heavily Doped Semiconductors, 140
Fistul, 1969, Heavily Doped Semiconductors, 48
Fistul, 1969, Heavily Doped Semiconductors, 53
Fistul, 1969, Heavily Doped Semiconductors, 104
Fistul, 1969, Heavily Doped Semiconductors, 143
Marfaing, 1984, Interface Semiconducteur-Electrolyte, CNRS, Ecole d'Hiver, Aussois, 10
Remeika, 1964, J. Appl. Phys., 35, 2803, 10.1063/1.1713110
Weiher, 1962, J. Appl. Phys., 33, 2834, 10.1063/1.1702560
Dordor, 1980, Rev. Phys. Appl., 15, 1607, 10.1051/rphysap:0198000150110160700
Fistul, 1969, Heavily Doped Semiconductors, 146
Fistul, 1969, Heavily Doped Semiconductors, 144
Fistul, 1969, Heavily Doped Semiconductors, 145