Charging effects of SiO2 thin film on Si substrate irradiated by penetrating electron beam
Tài liệu tham khảo
Bai, 2004, Electron beam induced conductivity in polymethyl methacrylate, polymide, ans SiO2 thin films, J. Vac. Sci. Technol. B, 22, 2907, 10.1116/1.1826062
Bai, 2018, Suppressing second electron yield based on porous anodic alumina, Acta Phys. Sin., 67
Ben, 2017, Effect of nanoclay concentration level on the electrical properties of polypropylene under electron irradiation in a SEM, J. Microsc., 265, 322, 10.1111/jmi.12502
Ben, 2017, Study of temperature effects on the electrical behavior of polypropylene-clay nanocomposites submitted to electron beam irradiation in a SEM, Micron, 98, 39, 10.1016/j.micron.2017.03.011
Borisov, 2010, Investigations of Electron beam induced conductivity in silicon oxide thin films, J. Surf. Investig. X-ray, Synchrotr. Neutron Techniq., 4, 754, 10.1134/S1027451010050095
Cazaux, 2012, Secondary electron emission and charging mechanisms in Auger Electron spectroscopy and related e-beam techniques, J. Electron Spectrosc. Relat. Phenom., 176, 58, 10.1016/j.elspec.2009.06.004
Cazaux, 2012, From the physics of secondary electron emission to image contrasts in scanning electron microscopy, J. Electron Microsc., 61, 261, 10.1093/jmicro/dfs048
Cornet, 2008, Electron beam charging of insulators with surface layer and leakage currents, J. Appl. Phys., 103, 10.1063/1.2890427
Fakhfakh, 2010, Experimental characterization of charge distribution and transport in electron irradiated PMMA, J. Non-Cryst. Solids, 358, 1157, 10.1016/j.jnoncrysol.2012.02.015
Gushterov, 2004, Trap-assisted tunneling in ion-implanted n-Si/SiO2 structures, Vacuum, 76, 315, 10.1016/j.vacuum.2004.07.037
Hoskins, 2017, Stateful characterization of resistive switching TiO2 with electron beam induced currents, Nat. Commun., 8, 1972, 10.1038/s41467-017-02116-9
Huo, 2019, Charging effect of polymer thin film under irradiation of high-energy transmission electron beam, Acta Phys. Sin., 68, 230201, 10.7498/aps.68.20191112
Joy, 1995, 25
Kuciauskas, 2017, Time-resolved correlative optical microscopy of charge-carrier transport, recombination, and space-charge fields in CdTe hetero structures, Appl. Phys. Lett., 110, 10.1063/1.4976696
Li, 2011, Self-consistent charging in dielectric films under defocused electron beam irradiation, Micron, 42, 443, 10.1016/j.micron.2010.12.007
Li, 2015, Surface potential dynamic characteristics of the insulating sample under high-energy electron irradiation, Acta Phys. Sin., 64
Li, 2018, Monte Carlo modeling on charging effect for structures with arbitrary geometries, J. Phys. D Appl. Phys., 51, 165301, 10.1088/1361-6463/aab2cf
Li, 2019, Time-dependent characteristics of secondary electron emission, J. Appl. Phys., 125
Ning, 1975, Electron trapping at positively charged centers in SiO2, Appl. Phys. Lett., 26, 248, 10.1063/1.88138
Oldham, 2003, Total ionizing dose effects in MOS oxides and devices, IEEE Trans. Nucl. Sci., 50, 483, 10.1109/TNS.2003.812927
Raftari, 2015, Self-consistent drift-diffusion-reaction model for the electron beam interaction with dielectric samples, J. Appl. Phys., 118, 410, 10.1063/1.4936201
Raftari, 2018, Modified and calibrated drift-diffusion-reaction model for time-domain analysis of charging phenomena in electron-beam irradiated insulators, AIP Adv., 8, 10.1063/1.4994879
Rau, 2008, The effect of contamination of dielectric target surfaces under electron irradiation, Appl. Surf. Sci., 254, 2110, 10.1016/j.apsusc.2007.08.076
Renoud, 2004, Secondary electron emission of an insulating target induced by a well-focused electron beam–Monte Carlo simulation study, Phys. Status. Solidi. A, 201, 2119, 10.1002/pssa.200306815
Taylor, 1981, Electron-beam-induced conductivity and related processes in insulating films, IEE Proc. A-Sci. Meas. Tech., 128, 174
Touzin, 2006, Electron beam charging of insulators: a self-consistent flight-drift model, J. Appl. Phys., 99, 114110, 10.1063/1.2201851
Zhang, 2009, Contrast mechanism due to interface trapped charges for a buried SiO2 microstructure in scanning electron microscopy, J. Electron Microsc., 58, 15, 10.1093/jmicro/dfn024