Barrier Properties of Electroplating Nickel Layer for Copper Metallization in Silicon Solar Cells

International Journal of Electrochemical Science - Tập 13 - Trang 11516-11525 - 2018
You Ren Cheng1, Wen Jauh Chen1, Keisuke Ohdaira2, Koichi Higashimine2
1Graduate School of Materials Science, National Yunlin University of Science and Technology, Douliu, Yunlin, Taiwan
2Japan Advanced Institute of Science and Technology, 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan

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