An examination of organometallic thermal stability and its relevance to low-temperature MOCVD growth of HgCdTe

Journal of Materials Research - Tập 3 Số 2 - Trang 329-334 - 1988
W. E. Hoke1, P.J. Lemonias1, R. Korenstein1
1Raytheon Research Division, 131 Spring Street, Lexington, Massachusetts 02173

Tóm tắt

A well-established stability model for hydrocarbon molecules is reviewed and then applied to organometallic compounds used in the epitaxial growth of HgCdTe films. For hydrocarbon molecules, the strength of carbon-hydrogen bonds is modified by neighboring organic groups. The mechanism for this effect is delocalization of the free radical electronic charge by the neighboring groups. The delocalization effect is present in organometallic compounds and is illustrated for tellurium, mercury, and cadmium compounds. An important application of the delocalization effect is the development of a low-temperature approach for pyrolytic metalorganic growth of HgCdTe.

Từ khóa


Tài liệu tham khảo

10.1016/0022-0248(81)90276-1

Irgolic, 1974, The Organic Chemistry of Tellurium

Bamford, 1972, Comprehensive Chemical Kinetics, 4, 215

10.1063/1.339005

10.1116/1.572274

Hartley, 1985, The Chemistry of the Metal-Carbon Bond, 2, 151

10.1063/1.96516

10.1063/1.95591

10.1063/1.96850

10.1557/PROC-90-379

Morrison, 1969, Organic Chemistry, 118

Weast, 1986, Handbook of Chemistry and Physics, F178

Hartley, 1982, The Chemistry of the Metal-Carbon Bond, 1, 53

1986, Organometallics for Vapor Phase Epitaxy, 90

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Journal of Materials Research

Tập 3 Số 2

329-334

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